Phase defect observation using extreme ultraviolet microscope

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 B, 2006, Pages 5378-5382

  Hamamoto, Kazuhiro ^a,d   Tanaka, Yuzuru ^a,d   Yoshizumi, Takahiro ^a,d   Hosokawa, Nobuyuki ^b,d   Sakaya, Noriyuki ^c,d   Hosoya, Morio ^c,d   Shoki, Tsutomu ^c,d   Watanabe, Takeo ^a,d   Kinoshita, Hiroo ^a,d  

^a UNIVERSITY OF HYOGO   (Japan)

^b Nitto Thin Film Laboratories Co Ltd   (Japan)

^c HOYA CORPORATION   (Japan)

^d Kawaguchi Center Bldg ^*  (Japan)

Author keywords

Defects; EUV lithography; EUV microscope; Mask; Multilayer

Indexed keywords

MASKS; MULTILAYERS; PHOTOLITHOGRAPHY; SUBSTRATES; ULTRAVIOLET RADIATION;

EUV MICROSCOPE; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); GLASS SUBSTRATES; PHASE DEFECTS;

OPTICAL MICROSCOPY;

EID: 33745676987     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.5378     Document Type: Review

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