Current status of EUV mask blanks and LTEM substrates defectivity and cleaning of blanks exposed in EUV ADT

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Kadaksham, Arun John ^a   Lee, Byunghoon ^a   House, Matt ^a   Laursen, Thomas ^b   Niekrewicz, Brian ^b   Rastegar, Abbas ^a  

^a SEMATECH   (United States)

^b ASML US Inc   (United States)

Author keywords

EUV Lithography; Mask Chucking Contamination; Mask Cleaning

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPES; AUGER MICROSCOPY; CLEANING PROCESS; CURRENT STATUS; DEFECT COMPOSITION; DEFECTIVITY; EUV LITHOGRAPHY; EUV MASK; EUV MASK BLANKS; LOW THERMAL EXPANSION MATERIALS; MASK BLANK; MASK CLEANING; MULTILAYER DEPOSITIONS; PARTICLE CONTAMINATION; ROOM ENVIRONMENT; SCANNING ELECTRON MICROSCOPE; SEM/EDS; SEMATECH;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; AUGERS; CLEANING; DEFECTS; INDOOR AIR POLLUTION; LITHOGRAPHY; PHOTOMASKS; SPHERES; THERMAL EXPANSION;

SUBSTRATES;

EID: 79957965706     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.880757     Document Type: Conference Paper

References (8)

1. E.M. Gullikson, E. Tejnil, T. Liang, A.R. Stivers "EUVL Defect Printability at the 32 nm Node," Proceedings of SPIE Vol. 5374, 0277-786X/04.
2. V. Jindal, P. Kearney, "Modeling growth of defects during multilayer deposition of EUV blanks by level set method," proceedings of SPIE, 2011.
3. A. Rastegar, A. John Kadaksham, S. Eichenlaub, B. Lee, "Determining critical defect size for EUV masks and substrates," 2009 International Symposium on Extreme Ultraviolet Lithography, Prague, Czech Republic.
4. Andy Ma, Patrick Kearney, Frank Goodwin, Masahiro Kishimoto*, Toshio Nakajima* Tomoya Tamura**, Anwei Jia, "EUVL Mask Blank Defect Inspection Capability at SEMATECH, " 2010 EUVL Symposium, Kobe, Japan.
5. th European Mask and Lithography Conference, Proc. of SPIE Vol. 7470 74700Z-1.
6. A. Rastegar, S. Eichenlaub, A. Kadaksham, and M. House, "Nanopit smoothing by cleaning," Alternative Lithography Technologies, Proc. of SPIE Vol. 7271 74710F-1.
7. A. Rastegar, A. John, B. Lee, M. House, J. Sohn, D. Ashworth. M. Kishimoto and J. Choi "Substrate, Blank and Mask Cleaning Contribution to EUV Mask Defectivity and Lifetime " EUVL Symposium, Kobe, Japan (2010)
8. Abbas Rastegar, Sean Eichenlaub, Arun John Kadaksham, Byunghoon Lee, and Matt House, "Particle removal challenges with EUV patterned masks for the sub-22 nm HP node," Proc. of SPIE Vol. 7636 76360N-1.