Phase-shifting effect of thin-absorber EUV masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8166, Issue , 2011, Pages

  Tanabe, Hiroyoshi ^a   Murachi, Tetsunori ^a   Lee, Sang H ^a   Chandhok, Manish ^a   Park, Seh Jin ^a   Zhang, Guojing ^a   Abe, Tsukasa ^b   Ogase, Taichi ^b   Hayashi, Naoya ^b  

^a INTEL CORPORATION   (United States)

^b DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

EUV mask; Phase shifting effect; Thin absorber

Indexed keywords

ABSORBER THICKNESS; EUV MASK; IMAGING PERFORMANCE; PHASE-SHIFTING; PHASE-SHIFTING MASK; PROCESS WINDOW; THIN ABSORBERS;

EXPERIMENTS; EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; PHASE SHIFT;

PHOTOMASKS;

EID: 81455147500     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.895149     Document Type: Conference Paper

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