Imaging performance improvement of an extreme ultraviolet microscope

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

  Takase, Kei ^a   Kamaji, Yoshito ^a   Sakagami, Naoki ^a   Iguchi, Takafumi ^a   Tada, Masaki ^a   Yamaguchi, Yuya ^a   Fukushima, Yasuyuki ^a   Harada, Tetsuo ^a   Watanabe, Takeo ^a   Kinoshita, Hiroo ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

A-THERMAL; ACTINIC MASK INSPECTION; AMPLITUDE DEFECTS; CHARGE COUPLED DEVICE CAMERA; COOLED CCD; EUV BLANK; EXTREME ULTRAVIOLET; GLASS SUBSTRATES; IMAGING OPTICS; IMAGING PERFORMANCE; IN-SITU; LOW CONTRAST; MULTIPLAYERS; NON-UNIFORM ILLUMINATION; OPTICAL COMPONENTS; PHASE DEFECTS; SCANNING SYSTEMS; SCHWARZSCHILD; SI WAFER; SURFACE ACCURACY; TURNING MIRRORS; UNIFORM ILLUMINATION; WAVE ABERRATIONS; WAVEFRONT ABERRATIONS;

ABERRATIONS; CAMERAS; CHARGE COUPLED DEVICES; DEFECTS; GLASS; MICROSCOPES; MIRRORS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SUBSTRATES; THERMAL NOISE; TURNING;

GEOMETRICAL OPTICS;

EID: 77955334634     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.06GD07     Document Type: Article

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