Quantitative evaluation of mask phase defects from through-focus EUV aerial images

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Mochi, Iacopo ^a   Goldberg, Kenneth A ^a   Xie, Ryan ^b   Yan, Pei Yang ^c   Yamazoe, Kenji ^d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c INTEL CORPORATION   (United States)

^d CANON INC   (Japan)

Author keywords

Extreme ultra violet; mask; phase defect; reconstruction

Indexed keywords

AERIAL IMAGES; AFM; CONVERGENCE SPEED; DEFECT MODELING; DETECTABILITY; EXTREME ULTRAVIOLETS; FOCAL PLANE; FOCUS SERIES; GERCHBERG-SAXTON ALGORITHM; HEIGHT PROFILES; IMAGE SERIES; IMPROVED METHODS; INTEGRATING INFORMATION; MULTILAYER DEPOSITIONS; MULTIPLE IMAGE; PHASE CHANGE; PHASE DEFECT; PHASE DEFECTS; PHASE PREDICTION; PHASE RETRIEVAL; PHOTON NOISE; QUANTITATIVE EVALUATION; RECONSTRUCTION; REDUCED SENSITIVITY;

DEFECTS;

EID: 79957959125     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881652     Document Type: Conference Paper

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