The coherent EUV scatterometry microscope for actinic mask inspection and metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8081, Issue , 2011, Pages

  Harada, Tetsuo ^a,c   Nakasuji, Masato ^a,c   Kimura, Teruhiko ^a,c   Nagata, Yutaka ^b,c   Watanabe, Takeo ^a,c   Kinoshita, Hiroo ^a,c  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c RIKEN   (Japan)

Author keywords

Actinic inspection; Actinic metrology; Coherent EUV scatterometry microscope; EUV lithography; Lens less Imaging

Indexed keywords

ABSORBER THICKNESS; ACTINIC INSPECTION; ACTINIC MASK INSPECTION; ACTINIC METROLOGY; AERIAL IMAGES; BACK-ILLUMINATED CCD; CRITICAL DIMENSION; DIFFRACTION INTENSITY; EUV MASK; GLASS SUBSTRATES; ITERATIVE CALCULATION; LENS-LESS IMAGING; LINE-AND-SPACE; MASK PATTERNS; MULTI-LAYER MIRRORS; PHASE INFORMATION; SCATTEROMETRY; SYNCHROTRON RADIATION FACILITY;

CCD CAMERAS; DEFECTS; DIFFRACTION; EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY; MICROSCOPES; OPTICAL TESTING; PHOTOMASKS; PINHOLE CAMERAS; SUBSTRATES; UNITS OF MEASUREMENT;

INSPECTION;

EID: 79960533318     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.896576     Document Type: Conference Paper

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