Development of coherent scatterometry microscope

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2000-2003

  Kinoshita, Hiroo ^a,c   Harada, Tetsuo ^a,c   Nakasuji, Masato ^a,c   Nagata, Yutaka ^b,c   Watanabe, Takeo ^a,c  

^a UNIVERSITY OF HYOGO   (Japan)

^b RIKEN   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

CD measurement; Defect inspection; EUVL; High harmonic laser source; Mask

Indexed keywords

ACTINIC INSPECTION; CD MEASUREMENTS; DEFECT INSPECTION; HIGH HARMONICS; MASK INSPECTION SYSTEMS; SCATTEROMETRY; SCHWARZSCHILD OPTICS;

DEFECTS; INSPECTION EQUIPMENT; LIGHT SOURCES;

INSPECTION;

EID: 79960048936     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2011.02.060     Document Type: Conference Paper

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