Functional ultrathin films and nanolaminates from aqueous solutions

Chemistry of Materials

Volumn 25, Issue 2, 2013, Pages 210-214

  Jiang, Kai ^a,d   Meyers, Stephen T ^a,d   Anderson, Michael D ^b   Johnson, David C ^c   Keszler, Douglas A ^a  

^a OREGON STATE UNIVERSITY   (United States)

^b IBM MICROELECTRONICS   (United States)

^c UNIVERSITY OF OREGON   (United States)

^d Inpria Corporation   (United States)

Author keywords

aluminum oxide phosphate; aqueous process; gate dielectrics; nanolaminates; titanium oxide

Indexed keywords

ALUMINUM OXIDES; ANNEALING TEMPERATURES; AQUEOUS PROCESS; CAPACITOR STRUCTURES; CRYSTALLIZATION BEHAVIOR; GATE LEAKAGES; HIGH BREAKDOWN FIELDS; INDIUM GALLIUM ZINC OXIDES; LOW-LEAKAGE CURRENT; NANO-LAMINATES; PRECURSOR CONCENTRATION; SMOOTH INTERFACE; SOLUTION PRECURSOR; SOLUTION-PROCESSED; TAILORABLE DIELECTRICS; TIO; TRANSISTOR PERFORMANCE; TRANSMISSION ELECTRON MICROSCOPY TEM; X RAY REFLECTIVITY;

AMORPHOUS SEMICONDUCTORS; CRYSTALLIZATION; DIELECTRIC MATERIALS; GATE DIELECTRICS; LEAKAGE CURRENTS; THIN FILM TRANSISTORS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; X RAY DIFFRACTION;

INTERFACES (MATERIALS);

EID: 84872938938     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm303268p     Document Type: Article

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