SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B

Volumn 28, Issue 6, 2010, Pages

Photopatternable inorganic hardmask

(6) Telecky, Alan a Xie, Peng b Stowers, Jason c Grenville, Andrew c Smith, Bruce b Keszler, Douglas A a

a OREGON STATE UNIVERSITY (United States)

b ROCHESTER INSTITUTE OF TECHNOLOGY (United States)

c Inpria Corporation (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; REFRACTIVE INDEX; SULFUR COMPOUNDS; ZIRCONIUM COMPOUNDS;

193-NM LITHOGRAPHY; CONTACT HOLES; ELECTRON-BEAM EXPOSURE; ETCH PROCESS; HALF PITCHES; HARDMASKS; INORGANICS; LINEWIDTH ROUGHNESS; PATTERN FIDELITY; PHOTOPATTERNABLE;

METALS;

EID: 78650150879 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3507889 Document Type: Article

Times cited : (28)

References (24)

1
- 84905956449
- ITRS Roadmap, 2009 edition
- ITRS Roadmap, 2009 edition, http://www.itrs.net

2
- 44149113331
- MIENEF 0167-9317,. 10.1016/j.mee.2007.12.001
- F. P. Gibbons, J. Manyam, S. Diegoli, M. Manickam, J. A. Preece, R. E. Palmer, and A. P. G. Robinson, Microelectron. Eng. MIENEF 0167-9317 85, 764 (2008). 10.1016/j.mee.2007.12.001
- (2008) Microelectron. Eng. , vol.85 , pp. 764
- Gibbons, F.P.¹ Manyam, J.² Diegoli, S.³ Manickam, M.⁴ Preece, J.A.⁵ Palmer, R.E.⁶ Robinson, A.P.G.⁷

3
- 17344384076
- MIENEF 0167-9317,. 10.1016/S0167-9317(04)00103-0
- H. Sailer, A. Ruderisch, D. P. Kern, and V. Schurig, Microelectron. Eng. MIENEF 0167-9317 73-74, 228 (2004). 10.1016/S0167-9317(04)00103-0
- (2004) Microelectron. Eng. , vol.7374 , pp. 228
- Sailer, H.¹ Ruderisch, A.² Kern, D.P.³ Schurig, V.⁴

4
- 44149092902
- MIENEF 0167-9317,. 10.1016/j.mee.2008.01.080
- R. A. Lawson, C. T. Lee, W. Yueh, L. Tolbert, and C. L. Henderson, Microelectron. Eng. MIENEF 0167-9317 85, 959 (2008). 10.1016/j.mee.2008.01.080
- (2008) Microelectron. Eng. , vol.85 , pp. 959
- Lawson, R.A.¹ Lee, C.T.² Yueh, W.³ Tolbert, L.⁴ Henderson, C.L.⁵

5
- 0031071160
- MIENEF 0167-9317,. 10.1016/S0167-9317(96)00176-1
- T. Itani, H. Yoshino, S. Hashimoto, M. Yamana, N. Samoto, and K. Kasama, Microelectron. Eng. MIENEF 0167-9317 35, 149 (1997). 10.1016/S0167-9317(96) 00176-1
- (1997) Microelectron. Eng. , vol.35 , pp. 149
- Itani, T.¹ Yoshino, H.² Hashimoto, S.³ Yamana, M.⁴ Samoto, N.⁵ Kasama, K.⁶

6
- 0022600556
- NANOSTRUCTURE FABRICATION IN METALS, INSULATORS, AND SEMICONDUCTORS USING SELF-DEVELOPING METAL INORGANIC RESIST
- DOI 10.1116/1.583332
- E. Kratschmer and M. Isaacson, J. Vac. Sci. Technol. B JVTBD9 1071-1023 4, 361 (1986). 10.1116/1.583332 (Pubitemid 17615125)
- (1986) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.4 , Issue.1 , pp. 361-364
- Kratschmer, E.¹ Isaacson, M.²

7
- 0013523901
- JVTBD9 1071-1023,. 10.1116/1.583905
- E. Kratschmer and M. Isaacson, J. Vac. Sci. Technol. B JVTBD9 1071-1023 5, 369 (1987). 10.1116/1.583905
- (1987) J. Vac. Sci. Technol. B , vol.5 , pp. 369
- Kratschmer, E.¹ Isaacson, M.²

8
- 0030284002
- JVTBD9 1071-1023,. 10.1116/1.588785
- J. M. Lavine and M. J. Buliszak, J. Vac. Sci. Technol. B JVTBD9 1071-1023 14, 3489 (1996). 10.1116/1.588785
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 3489
- Lavine, J.M.¹ Buliszak, M.J.²

9
- 0036530792
- Amorphous As-S-Se semiconductor resists for holography and lithography
- DOI 10.1016/S0022-3093(01)01126-7, PII S0022309301011267, Suppl. 2
- J. Teteris, J. Non-Cryst. Solids JNCSBJ 0022-3093 299-302, 978 (2002). 10.1016/S0022-3093(01)01126-7 (Pubitemid 34405827)
- (2002) Journal of Non-Crystalline Solids , vol.299-302 , Issue.PART 2 , pp. 978-982
- Teteris, J.¹

10
- 0020195046
- JAPIAU 0021-8979,. 10.1063/1.330043
- G. C. Chern and I. Lauks, J. Appl. Phys. JAPIAU 0021-8979 53, 6979 (1982). 10.1063/1.330043
- (1982) J. Appl. Phys. , vol.53 , pp. 6979
- Chern, G.C.¹ Lauks, I.²

11
- 5344224401
- JJAPA5 0021-4922,. 10.1143/JJAP.20.L149
- M. Baba and T. Ikeda, Jpn. J. Appl. Phys. JJAPA5 0021-4922 20, L149 (1981). 10.1143/JJAP.20.L149
- (1981) Jpn. J. Appl. Phys. , vol.20 , pp. 149
- Baba, M.¹ Ikeda, T.²

12
- 75249085895
- NNOTER 0957-4484,. 10.1088/0957-4484/21/6/065303
- H. Ridaoui, F. Wieder, A. Ponche, and O. Soppera, Nanotechnology NNOTER 0957-4484 21, 065303 (2010). 10.1088/0957-4484/21/6/065303
- (2010) Nanotechnology , vol.21 , pp. 065303
- Ridaoui, H.¹ Wieder, F.² Ponche, A.³ Soppera, O.⁴

13
- 77953490694
- PSISDG 0277-786X,. 10.1117/12.846672
- M. Trikeriotis, Proc. SPIE PSISDG 0277-786X 7639, 76390E (2010). 10.1117/12.846672
- (2010) Proc. SPIE , vol.7639
- Trikeriotis, M.¹

14
- 67349180205
- MIENEF 0167-9317,. 10.1016/j.mee.2008.11.034
- J. Stowers and D. A. Keszler, Microelectron. Eng. MIENEF 0167-9317 86, 730 (2009). 10.1016/j.mee.2008.11.034
- (2009) Microelectron. Eng. , vol.86 , pp. 730
- Stowers, J.¹ Keszler, D.A.²

15
- 34548552840
- Solution-processed HafSOx and ZircSOx inorganic thin-film dielectrics and nanolaminates
- DOI 10.1002/adfm.200601135
- J. T. Anderson, C. L. Munsee, C. M. Hung, T. M. Phung, G. S. Herman, D. C. Johnson, J. F. Wager, and D. A. Keszler, Adv. Funct. Mater. AFMDC6 1616-301X 17, 2117 (2007). 10.1002/adfm.200601135 (Pubitemid 47396197)
- (2007) Advanced Functional Materials , vol.17 , Issue.13 , pp. 2117-2124
- Anderson, J.T.¹ Munsee, C.L.² Hung, C.M.³ Phung, T.M.⁴ Herman, G.S.⁵ Johnson, D.C.⁶ Wager, J.F.⁷ Keszler, D.A.⁸

16
- 44149115438
- MIENEF 0167-9317,. 10.1016/j.mee.2008.02.007
- S. Pauliac-Vaujour, P. Brianceau, C. Comboroure, and O. Faynot, Microelectron. Eng. MIENEF 0167-9317 85, 800 (2008). 10.1016/j.mee.2008.02.007
- (2008) Microelectron. Eng. , vol.85 , pp. 800
- Pauliac-Vaujour, S.¹ Brianceau, P.² Comboroure, C.³ Faynot, O.⁴

17
- 35148876130
- Materials for and performance of multilayer lithography schemes
- DOI 10.1117/12.712342, Advances in Resist Materials and Processing Technology XXIV
- M. Weimer, Y. Wang, C. J. Neef, J. Claypool, K. Edwards, and Z. Zu, Proc. SPIE PSISDG 0277-786X 6519, 65192S (2007). 10.1117/12.712342 (Pubitemid 47551110)
- (2007) Proceedings of SPIE - The International Society for Optical Engineering , vol.6519 , Issue.PART 2
- Weimer, M.¹ Wang, Y.² Neef, C.J.³ Claypool, J.⁴ Edwards, K.⁵ Zhu, Z.⁶

18
- 25144433263
- 25nm immersion lithography at a 193nm wavelength
- DOI 10.1117/12.602414, 12, Optical Microlithography XVIII
- B. W. Smith, A. Bourov, Y. Fan, F. Cropanese, and P. Hammond, Proc. SPIE PSISDG 0277-786X 5754, 751 (2005). 10.1117/12.602414 (Pubitemid 41336142)
- (2005) Proceedings of SPIE - The International Society for Optical Engineering , vol.5754 , Issue.PART 1 , pp. 141-147
- Smith, B.W.¹ Fan, Y.² Slocum, M.³ Zavyalova, L.⁴

19
- 0002053947
- JVTBD9 1071-1023,. 10.1116/1.589837
- H. Namatsu, Y. Takahashi, K. Yamazaki, T. Yamaguchi, M. Nagase, and K. Kurihara, J. Vac. Sci. Technol. B JVTBD9 1071-1023 16, 69 (1998). 10.1116/1.589837
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 69
- Namatsu, H.¹ Takahashi, Y.² Yamazaki, K.³ Yamaguchi, T.⁴ Nagase, M.⁵ Kurihara, K.⁶

20
- 77952075654
- PSISDG 0277-786X,. 10.1117/12.840419
- D. J. Guerrero, D. M. Sullivan, and R. M. L. Mercado, Proc. SPIE PSISDG 0277-786X 7520, 75200M (2009). 10.1117/12.840419
- (2009) Proc. SPIE , vol.7520
- Guerrero, D.J.¹ Sullivan, D.M.² Mercado, R.M.L.³

21
- 77952018061
- PSISDG 0277-786X.
- R. Sakamoto, Proc. SPIE PSISDG 0277-786X 7520, 75201Y (2009).
- (2009) Proc. SPIE , vol.7520
- Sakamoto, R.¹

22
- 35148835760
- Novel high-index resists for 193 nm immersion lithography and beyond
- DOI 10.1117/12.715108, Advances in Resist Materials and Processing Technology XXIV
- I. Blakey, Proc. SPIE PSISDG 0277-786X 6519, 651909 (2007). 10.1117/12.715108 (Pubitemid 47551029)
- (2007) Proceedings of SPIE - The International Society for Optical Engineering , vol.6519 , Issue.PART 1 , pp. 651909
- Blakey, I.¹ Chen, L.² Dargaville, B.³ Liu, H.⁴ Whittaker, A.⁵ Conley, W.⁶ Piscani, E.⁷ Rich, G.⁸ Williams, A.⁹ Zimmerman, P.¹⁰

23
- 84905951498
- A. Grenville, Future Fab Intl. 20, 76 (2007).
- (2007) Future Fab Intl. , vol.20 , pp. 76
- Grenville, A.¹

24
- 77953449273
- PSISDG 0277-786X,. 10.1117/12.848438
- P. Naulleau, Proc. SPIE PSISDG 0277-786X 7636, 76361J (2010). 10.1117/12.848438
- (2010) Proc. SPIE , vol.7636
- Naulleau, P.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.