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Journal of Vacuum Science and Technology B

Volumn 28, Issue 4, 2010, Pages 823-828

All-inorganic thermal nanoimprint process

(3) Weiss, Dirk N a Meyers, Stephen T b,c Keszler, Douglas A b

a Box 352140 (United States)

b OREGON STATE UNIVERSITY (United States)

c Inpria Corporation (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; AMORPHOUS FILMS; DEFECTS;

DEFECT-FREE; ENVIRONMENTALLY BENIGN; INORGANIC RESIST; INORGANICS; NANO IMPRINT; NANOIMPRINT PROCESS; ORGANIC ADDITIVES; RESIST MATERIALS; THERMAL NANOIMPRINT; WATER BASED;

ETHYLENE;

EID: 77957227761 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3463454 Document Type: Conference Paper

Times cited : (15)

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