Electrical characteristics and conduction mechanisms of metal-insulator-metal capacitors with nanolaminated Al2 O3 -Hf O2 dielectrics

Applied Physics Letters

Volumn 93, Issue 9, 2008, Pages

  Ding, Shi Jin ^a   Xu, Jun ^a   Huang, Yue ^a   Sun, Qing Qing ^a   Zhang, David Wei ^a   Li, Ming Fu ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CAPACITORS; DIELECTRIC DEVICES; ELECTRIC EQUIPMENT; ELECTRIC LOAD MANAGEMENT; HEAT CONDUCTION; LEAKAGE CURRENTS; MECHANISMS; METAL INSULATOR BOUNDARIES; METALS; MIM DEVICES; OZONE WATER TREATMENT; PHOTOLITHOGRAPHY; SEMICONDUCTOR INSULATOR BOUNDARIES;

BREAKDOWN FIELDS; ELECTRICAL CHARACTERISTICS; METAL-INSULATOR-METAL CAPACITORS;

HAFNIUM COMPOUNDS;

EID: 51349105764     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2969399     Document Type: Article

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