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Volumn 102, Issue 3, 2013, Pages

Piezoresistance of nano-scale silicon up to 2 GPa in tension

Author keywords

[No Author keywords available]

Indexed keywords

DOPANT CONCENTRATIONS; NANO SCALE; ON CHIPS; P-TYPE; PIEZORESISTANCE; UNIAXIAL TENSIONS;

EID: 84872908973     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4788919     Document Type: Article
Times cited : (27)

References (34)
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    • 10.1109/JPROC.2009.2013612
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    • Barlian, A.1    Park, W.2
  • 23
    • 34248208452 scopus 로고    scopus 로고
    • 10.1038/nnano.2006.53
    • R. He and P. Yang, Nat. Nanotechnol. 1, 42 (2006). 10.1038/nnano.2006.53
    • (2006) Nat. Nanotechnol. , vol.1 , pp. 42
    • He, R.1    Yang, P.2
  • 24
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    • 84872979850 scopus 로고    scopus 로고
    • See supplementary material at http://dx.doi.org/10.1063/1.4788919 E-APPLAB-102-077304 for the schematic fabrication process for producing an elementary tensile stage structure and for Figures S2 and S3 showing the design and characterization of two mutually opposite parallel array of structures.
  • 34
    • 36149025707 scopus 로고
    • 10.1103/PhysRev.71.717
    • J. Bardeen, Phys. Rev. 71, 717 (1947). 10.1103/PhysRev.71.717
    • (1947) Phys. Rev. , vol.71 , pp. 717
    • Bardeen, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.