-
1
-
-
0001258961
-
The heat of formation of silica
-
Good, W. D. The heat of formation of silica J. Phys. Chem. 1962, 66, 380-381
-
(1962)
J. Phys. Chem.
, vol.66
, pp. 380-381
-
-
Good, W.D.1
-
3
-
-
0032664810
-
Silicon nitride: Enthalpy of formation of the alpha- and beta-polymorphs and the effect of C and O impurities
-
Liang, J. J.; Topor, L.; Navrotsky, A.; Mitomo, M. Silicon nitride: enthalpy of formation of the alpha- and beta-polymorphs and the effect of C and O impurities J. Mater. Res. 1999, 14, 1959-1968
-
(1999)
J. Mater. Res.
, vol.14
, pp. 1959-1968
-
-
Liang, J.J.1
Topor, L.2
Navrotsky, A.3
Mitomo, M.4
-
5
-
-
79952576990
-
Control and stability of self-assembled monolayers under biosensing conditions
-
Seitz, O.; Fernandes, P. G.; Tian, R. H.; Karnik, N.; Wen, H. C.; Stiegler, H.; Chapman, R. A.; Vogel, E. M.; Chabal, Y. J. Control and stability of self-assembled monolayers under biosensing conditions J. Mater. Chem. 2011, 21, 4384-4392
-
(2011)
J. Mater. Chem.
, vol.21
, pp. 4384-4392
-
-
Seitz, O.1
Fernandes, P.G.2
Tian, R.H.3
Karnik, N.4
Wen, H.C.5
Stiegler, H.6
Chapman, R.A.7
Vogel, E.M.8
Chabal, Y.J.9
-
6
-
-
84863474819
-
Hybrids of organic molecules and flat, oxide-free silicon: High-density monolayers, electronic properties, and functionalization
-
Li, Y.; Calder, S.; Yaffe, O.; Cahen, D.; Haick, H.; Kronik, L.; Zuilhof, H. Hybrids of organic molecules and flat, oxide-free silicon: high-density monolayers, electronic properties, and functionalization Langmuir 2012, 28, 9920-9929
-
(2012)
Langmuir
, vol.28
, pp. 9920-9929
-
-
Li, Y.1
Calder, S.2
Yaffe, O.3
Cahen, D.4
Haick, H.5
Kronik, L.6
Zuilhof, H.7
-
7
-
-
37549026006
-
Heads or tails: Which is more important in molecular self-assembly?
-
Bent, S. F. Heads or tails: which is more important in molecular self-assembly? ACS Nano 2007, 1, 10-12
-
(2007)
ACS Nano
, vol.1
, pp. 10-12
-
-
Bent, S.F.1
-
8
-
-
79957679992
-
Mild and efficient functionalization of hydrogen-terminated Si(111) via sonochemical activated hydrosilylation
-
Zhong, Y. L.; Bernasek, S. L. Mild and efficient functionalization of hydrogen-terminated Si(111) via sonochemical activated hydrosilylation J. Am. Chem. Soc. 2011, 133, 8118-8121
-
(2011)
J. Am. Chem. Soc.
, vol.133
, pp. 8118-8121
-
-
Zhong, Y.L.1
Bernasek, S.L.2
-
9
-
-
0008883364
-
Adsorption of phosphorus on Si(111): Structure and chemical reactivity
-
Bozso, F.; Avouris, P. Adsorption of phosphorus on Si(111): structure and chemical reactivity Phys. Rev. B 1991, 43, 1847-1850
-
(1991)
Phys. Rev. B
, vol.43
, pp. 1847-1850
-
-
Bozso, F.1
Avouris, P.2
-
10
-
-
0029780707
-
Alkylation of Si surfaces using a two-step halogenation Grignard route
-
Bansal, A.; Li, X. L.; Lauermann, I.; Lewis, N. S.; Yi, S. I.; Weinberg, W. H. Alkylation of Si surfaces using a two-step halogenation Grignard route J. Am. Chem. Soc. 1996, 118, 7225-7226
-
(1996)
J. Am. Chem. Soc.
, vol.118
, pp. 7225-7226
-
-
Bansal, A.1
Li, X.L.2
Lauermann, I.3
Lewis, N.S.4
Yi, S.I.5
Weinberg, W.H.6
-
11
-
-
77249131154
-
Nanopatterning Si(111) surfaces as a selective surface-chemistry route
-
Michalak, D. J.; Amy, S. R.; Aureau, D.; Dai, M.; Esteve, A.; Chabal, Y. J. Nanopatterning Si(111) surfaces as a selective surface-chemistry route Nat. Mater. 2010, 9, 266-271
-
(2010)
Nat. Mater.
, vol.9
, pp. 266-271
-
-
Michalak, D.J.1
Amy, S.R.2
Aureau, D.3
Dai, M.4
Esteve, A.5
Chabal, Y.J.6
-
12
-
-
70349306255
-
Nitrogen interaction with hydrogen-terminated silicon surfaces at the atomic scale
-
Dai, M.; Wang, Y.; Kwon, J.; Halls, M. D.; Chabal, Y. J. Nitrogen interaction with hydrogen-terminated silicon surfaces at the atomic scale Nat. Mater. 2009, 8, 825-830
-
(2009)
Nat. Mater.
, vol.8
, pp. 825-830
-
-
Dai, M.1
Wang, Y.2
Kwon, J.3
Halls, M.D.4
Chabal, Y.J.5
-
13
-
-
84855530248
-
Chemical and electrical passivation of Si(111) surfaces
-
Tian, F. Y.; Yang, D.; Opila, R. L.; Teplyakov, A. V. Chemical and electrical passivation of Si(111) surfaces Appl. Surf. Sci. 2012, 258, 3019-3026
-
(2012)
Appl. Surf. Sci.
, vol.258
, pp. 3019-3026
-
-
Tian, F.Y.1
Yang, D.2
Opila, R.L.3
Teplyakov, A.V.4
-
14
-
-
77954893894
-
Reactivity of selectively terminated single crystal silicon surfaces
-
Perrine, K. A.; Teplyakov, A. V. Reactivity of selectively terminated single crystal silicon surfaces Chem. Soc. Rev. 2010, 39, 3256-3274
-
(2010)
Chem. Soc. Rev.
, vol.39
, pp. 3256-3274
-
-
Perrine, K.A.1
Teplyakov, A.V.2
-
15
-
-
37549035453
-
Chemical manipulation of multifunctional hydrocarbons on silicon surfaces
-
Leftwich, T. R.; Teplyakov, A. V. Chemical manipulation of multifunctional hydrocarbons on silicon surfaces Surf. Sci. Rep. 2008, 63, 1-71
-
(2008)
Surf. Sci. Rep.
, vol.63
, pp. 1-71
-
-
Leftwich, T.R.1
Teplyakov, A.V.2
-
16
-
-
77952861198
-
Wet chemical routes to the assembly of organic monolayers on silicon surfaces via the formation of Si-C bonds: Surface preparation, passivation and functionalization
-
Ciampi, S.; Harper, J. B.; Gooding, J. J. Wet chemical routes to the assembly of organic monolayers on silicon surfaces via the formation of Si-C bonds: surface preparation, passivation and functionalization Chem. Soc. Rev. 2010, 39, 2158-2183
-
(2010)
Chem. Soc. Rev.
, vol.39
, pp. 2158-2183
-
-
Ciampi, S.1
Harper, J.B.2
Gooding, J.J.3
-
19
-
-
0034509259
-
3 adsorption and dissociation on Si(100)-(2 × 1)
-
3 adsorption and dissociation on Si(100)-(2 × 1) Surf. Sci. 2000, 469, 9-20
-
(2000)
Surf. Sci.
, vol.469
, pp. 9-20
-
-
Widjaja, Y.1
Musgrave, C.B.2
-
21
-
-
67649130772
-
3-saturated Si(001)-2 × 1: Theoretical predictions and experimental observations at 300 K
-
3-saturated Si(001)-2 × 1: theoretical predictions and experimental observations at 300 K Phys. Rev. B 2009, 79, 205317
-
(2009)
Phys. Rev. B
, vol.79
, pp. 205317
-
-
Mathieu, C.1
Bai, X.X.2
Bournel, F.3
Gallet, J.J.4
Carniato, S.5
Rochet, F.6
Sirotti, F.7
Silly, M.G.8
Chauvet, C.9
Krizmancic, D.10
Hennies, F.11
-
24
-
-
0002875625
-
Ammonia as a precursor in electron-enhanced nitridation of Si(100)
-
Bater, C.; Sanders, M.; Craig, J. H. Ammonia as a precursor in electron-enhanced nitridation of Si(100) Surf. Interface Anal. 2000, 29, 208-214
-
(2000)
Surf. Interface Anal.
, vol.29
, pp. 208-214
-
-
Bater, C.1
Sanders, M.2
Craig, J.H.3
-
25
-
-
29744444866
-
3 on Si(001): Self-organized patterns of adsorbates investigated by a combination of scanning tunneling microscopy experiments and density functional theory calculations
-
3 on Si(001): Self-organized patterns of adsorbates investigated by a combination of scanning tunneling microscopy experiments and density functional theory calculations Phys. Rev. B 2005, 72, 113304
-
(2005)
Phys. Rev. B
, vol.72
, pp. 113304
-
-
Owen, J.H.G.1
Bowler, D.R.2
Kusano, S.3
Miki, K.4
-
30
-
-
55149106801
-
Role of surface strain in the subsurface migration of adsorbates on silicon
-
Rodriguez-Reyes, J. C. F.; Teplyakov, A. V. Role of surface strain in the subsurface migration of adsorbates on silicon Phys. Rev. B 2008, 78, 165314
-
(2008)
Phys. Rev. B
, vol.78
, pp. 165314
-
-
Rodriguez-Reyes, J.C.F.1
Teplyakov, A.V.2
-
32
-
-
33645155862
-
3 on Si(111)7 × 7: A high-resolution core-level photoemission study
-
3 on Si(111)7 × 7: a high-resolution core-level photoemission study Phys. Rev. B 2006, 73, 115328
-
(2006)
Phys. Rev. B
, vol.73
, pp. 115328
-
-
Cho, I.K.1
Kim, Y.K.2
Yeom, H.W.3
-
33
-
-
0000684216
-
3 on the Si(111)-(7 × 7) surface - Low-temperature dissociative adsorption and thermal effects
-
3 on the Si(111)-(7 × 7) surface-low- temperature dissociative adsorption and thermal effects J. Chem. Phys. 1992, 96, 7826-7837
-
(1992)
J. Chem. Phys.
, vol.96
, pp. 7826-7837
-
-
Colaianni, M.L.1
Chen, P.J.2
Yates Jr., J.T.3
-
34
-
-
76049119945
-
3 on Si(111)-(7 × 7)
-
3 on Si(111)-(7 × 7) J. Phys.: Condens. Matter 2010, 22, 08502
-
(2010)
J. Phys.: Condens. Matter
, vol.22
, pp. 08502
-
-
Zang, K.1
Guo, Q.M.2
Fu, H.3
Yu, Y.H.4
Qin, Z.H.5
Cao, G.Y.6
-
36
-
-
2342484288
-
2 on Si(111)-(7 × 7)
-
2 on Si(111)-(7 × 7) Phys. Rev. B 2004, 69, 125340
-
(2004)
Phys. Rev. B
, vol.69
, pp. 125340
-
-
Bengio, S.1
Ascolani, H.2
Franco, N.3
Avila, J.4
Asensio, M.C.5
Bradshaw, A.M.6
Woodruff, D.P.7
-
37
-
-
36749084058
-
3 decomposition on the Si(111)-7 × 7 surface: A DFT cluster model study
-
3 decomposition on the Si(111)-7 × 7 surface: a DFT cluster model study J. Phys. Chem. C 2007, 111, 16974-16981
-
(2007)
J. Phys. Chem. C
, vol.111
, pp. 16974-16981
-
-
Wang, X.L.1
Xu, X.2
-
38
-
-
0036199148
-
Reactions of some [C,N,O]-containing molecules with Si surfaces: Experimental and theoretical studies
-
Lu, X.; Lin, M. C. Reactions of some [C,N,O]-containing molecules with Si surfaces: experimental and theoretical studies Int. Rev. Phys. Chem. 2002, 21, 137-184
-
(2002)
Int. Rev. Phys. Chem.
, vol.21
, pp. 137-184
-
-
Lu, X.1
Lin, M.C.2
-
39
-
-
0037454684
-
Molecular and dissociative bonding of amines with the Si(111)-(7 × 7) surface
-
Cao, X. P.; Hamers, R. J. Molecular and dissociative bonding of amines with the Si(111)-(7 × 7) surface Surf. Sci. 2003, 523, 241-251
-
(2003)
Surf. Sci.
, vol.523
, pp. 241-251
-
-
Cao, X.P.1
Hamers, R.J.2
-
40
-
-
0035823826
-
Silicon surfaces as electron acceptors: Dative bonding of amines with Si(001) and Si(111) surfaces
-
Cao, X. P.; Hamers, R. J. Silicon surfaces as electron acceptors: dative bonding of amines with Si(001) and Si(111) surfaces J. Am. Chem. Soc. 2001, 123, 10988-10996
-
(2001)
J. Am. Chem. Soc.
, vol.123
, pp. 10988-10996
-
-
Cao, X.P.1
Hamers, R.J.2
-
41
-
-
0035827169
-
Reactions of methylamines at the Si(100)-2 × 1 surface
-
Mui, C.; Wang, G. T.; Bent, S. F.; Musgrave, C. B. Reactions of methylamines at the Si(100)-2 × 1 surface J. Chem. Phys. 2001, 114, 10170-10180
-
(2001)
J. Chem. Phys.
, vol.114
, pp. 10170-10180
-
-
Mui, C.1
Wang, G.T.2
Bent, S.F.3
Musgrave, C.B.4
-
42
-
-
0037123221
-
Proton transfer reactions on semiconductor surfaces
-
Mui, C.; Han, J. H.; Wang, G. T.; Musgrave, C. B.; Bent, S. F. Proton transfer reactions on semiconductor surfaces J. Am. Chem. Soc. 2002, 124, 4027-4038
-
(2002)
J. Am. Chem. Soc.
, vol.124
, pp. 4027-4038
-
-
Mui, C.1
Han, J.H.2
Wang, G.T.3
Musgrave, C.B.4
Bent, S.F.5
-
43
-
-
84864984123
-
Triethylamine on Si(001)-(2 × 1) at 300 K: Molecular adsorption and site configurations leading to dissociation
-
Naitabdi, A. B.; Bournel, F.; Gallet, J. J.; Markovits, A.; Rochet, F.; Borensztein, Y.; Silly, M. G.; Sirotti, F. Triethylamine on Si(001)-(2 × 1) at 300 K: molecular adsorption and site configurations leading to dissociation J. Phys. Chem. C 2012, 116, 16473-16486
-
(2012)
J. Phys. Chem. C
, vol.116
, pp. 16473-16486
-
-
Naitabdi, A.B.1
Bournel, F.2
Gallet, J.J.3
Markovits, A.4
Rochet, F.5
Borensztein, Y.6
Silly, M.G.7
Sirotti, F.8
-
44
-
-
0026755088
-
Chemically modified semiconductor surfaces - 1,4-phenylenediamine on Si(100)
-
Kugler, T.; Thibaut, U.; Abraham, M.; Folkers, G.; Gopel, W. Chemically modified semiconductor surfaces-1,4-phenylenediamine on Si(100) Surf. Sci. 1992, 260, 64-74
-
(1992)
Surf. Sci.
, vol.260
, pp. 64-74
-
-
Kugler, T.1
Thibaut, U.2
Abraham, M.3
Folkers, G.4
Gopel, W.5
-
45
-
-
0035837985
-
Bonding of nitrogen-containing organic molecules to the silicon(001) surface: The role of aromaticity
-
Cao, X. P.; Coulter, S. K.; Ellison, M. D.; Liu, H. B.; Liu, J. M.; Hamers, R. J. Bonding of nitrogen-containing organic molecules to the silicon(001) surface: the role of aromaticity J. Phys. Chem. B 2001, 105, 3759-3768
-
(2001)
J. Phys. Chem. B
, vol.105
, pp. 3759-3768
-
-
Cao, X.P.1
Coulter, S.K.2
Ellison, M.D.3
Liu, H.B.4
Liu, J.M.5
Hamers, R.J.6
-
46
-
-
79551623190
-
Tuning the reactivity of semiconductor surfaces by functionalization with amines of different basicity
-
Bent, S. F.; Kachian, J. S.; Rodriguez-Reyes, J. C. F.; Teplyakov, A. V. Tuning the reactivity of semiconductor surfaces by functionalization with amines of different basicity Proc. Natl. Acad. Sci. U.S.A. 2011, 108, 956-960
-
(2011)
Proc. Natl. Acad. Sci. U.S.A.
, vol.108
, pp. 956-960
-
-
Bent, S.F.1
Kachian, J.S.2
Rodriguez-Reyes, J.C.F.3
Teplyakov, A.V.4
-
47
-
-
0000679335
-
Characterization and simulation of organic adsorbates on the Si(100)(2 × 1)-surface using photoelectron spectroscopy and quantum mechanical calculations
-
Kugler, T.; Ziegler, C.; Gopel, W. Characterization and simulation of organic adsorbates on the Si(100)(2 × 1)-surface using photoelectron spectroscopy and quantum mechanical calculations Mater. Sci. Eng., B 1996, 37, 112-115
-
(1996)
Mater. Sci. Eng., B
, vol.37
, pp. 112-115
-
-
Kugler, T.1
Ziegler, C.2
Gopel, W.3
-
48
-
-
0038241847
-
Reactions of cyclic aliphatic and aromatic amines on Ge(100)-2 × 1 and Si(100)-2 × 1
-
Wang, G. T.; Mui, C.; Tannaci, J. F.; Filler, M. A.; Musgrave, C. B.; Bent, S. F. Reactions of cyclic aliphatic and aromatic amines on Ge(100)-2 × 1 and Si(100)-2 × 1 J. Phys. Chem. B 2003, 107, 4982-4996
-
(2003)
J. Phys. Chem. B
, vol.107
, pp. 4982-4996
-
-
Wang, G.T.1
Mui, C.2
Tannaci, J.F.3
Filler, M.A.4
Musgrave, C.B.5
Bent, S.F.6
-
49
-
-
84872118630
-
Chapter 6. Influence of functioanl groups in substituted aromatic molecules on the surface of reaction channel in semiconductor surface functionalization
-
In; Tao, F. Bernasek, S. L. Wiley: New York
-
Teplyakov, A. V., Chapter 6. Influence of functioanl groups in substituted aromatic molecules on the surface of reaction channel in semiconductor surface functionalization. In Functionalization of Semiconductor Surfaces; Tao, F.; Bernasek, S. L., Eds.; Wiley: New York, 2012; pp 105-152.
-
(2012)
Functionalization of Semiconductor Surfaces
, pp. 105-152
-
-
Teplyakov, A.V.1
-
50
-
-
27744525374
-
Selective adsorption of pyridine at isolated reactive sites on Si(100)
-
Miwa, J. A.; Eves, B. J.; Rosei, F.; Lopinski, G. P. Selective adsorption of pyridine at isolated reactive sites on Si(100) J. Phys. Chem. B 2005, 109, 20055-20059
-
(2005)
J. Phys. Chem. B
, vol.109
, pp. 20055-20059
-
-
Miwa, J.A.1
Eves, B.J.2
Rosei, F.3
Lopinski, G.P.4
-
51
-
-
84872121668
-
-
S.F. In, Tao, F. Bernasek, S. L. Wiley: Hoboken, NJ, Chapter 5
-
K. T.; Bent, S. F. In Functionalization of Semiconductor Surfaces, Tao, F.; Bernasek, S. L., Eds.; Wiley: Hoboken, NJ, 2012; Chapter 5, pp 89-103.
-
(2012)
Functionalization of Semiconductor Surfaces
, pp. 89-103
-
-
Bent, K.T.1
-
52
-
-
0042563123
-
Adsorption and thermal chemistry of nitroethane on Si(100)-2 × 1
-
Bocharov, S.; Mathauser, A. T.; Teplyakov, A. V. Adsorption and thermal chemistry of nitroethane on Si(100)-2 × 1 J. Phys. Chem. B 2003, 107, 7776-7782
-
(2003)
J. Phys. Chem. B
, vol.107
, pp. 7776-7782
-
-
Bocharov, S.1
Mathauser, A.T.2
Teplyakov, A.V.3
-
53
-
-
10144230051
-
Adsorption, ordering, and chemistry of nitrobenzene on Si(100)-2 × 1
-
Bocharov, S.; Teplyakov, A. V. Adsorption, ordering, and chemistry of nitrobenzene on Si(100)-2 × 1 Surf. Sci. 2004, 573, 403-412
-
(2004)
Surf. Sci.
, vol.573
, pp. 403-412
-
-
Bocharov, S.1
Teplyakov, A.V.2
-
54
-
-
33646346119
-
Nitro group as a means of attaching organic molecules to silicon: Nitrobenzene on Si(100)-2 × 1
-
Mendez de Leo, L. P.; Teplyakov, A. V. Nitro group as a means of attaching organic molecules to silicon: nitrobenzene on Si(100)-2 × 1 J. Phys. Chem. B 2006, 110, 6899-6905
-
(2006)
J. Phys. Chem. B
, vol.110
, pp. 6899-6905
-
-
Mendez De Leo, L.P.1
Teplyakov, A.V.2
-
55
-
-
70449572413
-
Coadsorption of ethylene and nitrobenzene on Si(100)-2 × 1: Toward surface patterning on the molecular level
-
Madachik, M. R.; Teplyakov, A. V. Coadsorption of ethylene and nitrobenzene on Si(100)-2 × 1: toward surface patterning on the molecular level J. Phys. Chem. C 2009, 113, 18270-18275
-
(2009)
J. Phys. Chem. C
, vol.113
, pp. 18270-18275
-
-
Madachik, M.R.1
Teplyakov, A.V.2
-
56
-
-
65549104771
-
Reactions of aromatic bifunctional molecules on silicon surfaces: Nitrosobenzene and nitrobenzene
-
Perrine, K. A.; Leftwich, T. R.; Weiland, C. R.; Madachik, M. R.; Opila, R. L.; Teplyakov, A. V. Reactions of aromatic bifunctional molecules on silicon surfaces: nitrosobenzene and nitrobenzene J. Phys. Chem. C 2009, 113, 6643-6653
-
(2009)
J. Phys. Chem. C
, vol.113
, pp. 6643-6653
-
-
Perrine, K.A.1
Leftwich, T.R.2
Weiland, C.R.3
Madachik, M.R.4
Opila, R.L.5
Teplyakov, A.V.6
-
57
-
-
33746345902
-
Azide reactions for controlling clean silicon surface chemistry: Benzylazide on Si(100)-2 × 1
-
Bocharov, S.; Dmitrenko, O.; Mendez de Leo, L. P.; Teplyakov, A. V. Azide reactions for controlling clean silicon surface chemistry: benzylazide on Si(100)-2 × 1 J. Am. Chem. Soc. 2006, 128, 9300-9301
-
(2006)
J. Am. Chem. Soc.
, vol.128
, pp. 9300-9301
-
-
Bocharov, S.1
Dmitrenko, O.2
Mendez De Leo, L.P.3
Teplyakov, A.V.4
-
58
-
-
47149088646
-
Cycloaddition reactions of phenylazide and benzylazide on a Si(100)-2 × 1 surface
-
Leftwich, T. R.; Teplyakov, A. V. Cycloaddition reactions of phenylazide and benzylazide on a Si(100)-2 × 1 surface J. Phys. Chem. C 2008, 112, 4297-4303
-
(2008)
J. Phys. Chem. C
, vol.112
, pp. 4297-4303
-
-
Leftwich, T.R.1
Teplyakov, A.V.2
-
61
-
-
57149096043
-
Dehydrative cyclocondensation reactions on hydrogen-terminated Si(100) and Si(111): An ex situ tool for the modification of semiconductor surfaces
-
Leftwich, T. R.; Madachik, M. R.; Teplyakov, A. V. Dehydrative cyclocondensation reactions on hydrogen-terminated Si(100) and Si(111): an ex situ tool for the modification of semiconductor surfaces J. Am. Chem. Soc. 2008, 130, 16216-16223
-
(2008)
J. Am. Chem. Soc.
, vol.130
, pp. 16216-16223
-
-
Leftwich, T.R.1
Madachik, M.R.2
Teplyakov, A.V.3
-
63
-
-
79952597167
-
On the mechanism of silicon activation by halogen atoms
-
Soria, F. A.; Patrito, E. M.; Paredes-Olivera, P. On the mechanism of silicon activation by halogen atoms Langmuir 2011, 27, 2613-2624
-
(2011)
Langmuir
, vol.27
, pp. 2613-2624
-
-
Soria, F.A.1
Patrito, E.M.2
Paredes-Olivera, P.3
-
64
-
-
34547407215
-
Preparation of organic monolayers with azide on porous silicon via Si-N bonds
-
Wang, J.; Guo, D. J.; Xia, B.; Chao, J.; Xiao, S. J. Preparation of organic monolayers with azide on porous silicon via Si-N bonds Colloids Surf., A 2007, 305, 66-75
-
(2007)
Colloids Surf., A
, vol.305
, pp. 66-75
-
-
Wang, J.1
Guo, D.J.2
Xia, B.3
Chao, J.4
Xiao, S.J.5
-
65
-
-
0033585523
-
Assembly of organic molecules on silicon surfaces via the Si-N linkage
-
Bergerson, W. F.; Mulder, J. A.; Hsung, R. P.; Zhu, X. Y. Assembly of organic molecules on silicon surfaces via the Si-N linkage J. Am. Chem. Soc. 1999, 121, 454-455
-
(1999)
J. Am. Chem. Soc.
, vol.121
, pp. 454-455
-
-
Bergerson, W.F.1
Mulder, J.A.2
Hsung, R.P.3
Zhu, X.Y.4
-
66
-
-
33748298781
-
The mechanism of amine formation on Si(100) activated with chlorine atoms
-
Finstad, C. C.; Thorsness, A. G.; Muscat, A. J. The mechanism of amine formation on Si(100) activated with chlorine atoms Surf. Sci. 2006, 600, 3363-3374
-
(2006)
Surf. Sci.
, vol.600
, pp. 3363-3374
-
-
Finstad, C.C.1
Thorsness, A.G.2
Muscat, A.J.3
-
67
-
-
40649115660
-
Ammonia adsorption on Cl/Si(001): First-principles calculations
-
Lange, B.; Schmidt, W. G. Ammonia adsorption on Cl/Si(001): first-principles calculations Surf. Sci. 2008, 602, 1207-1211
-
(2008)
Surf. Sci.
, vol.602
, pp. 1207-1211
-
-
Lange, B.1
Schmidt, W.G.2
-
69
-
-
57349171432
-
Azidation of silicon(111) surfaces
-
Cao, P. G.; Xu, K.; Heath, J. R. Azidation of silicon(111) surfaces J. Am. Chem. Soc. 2008, 130, 14910-14911
-
(2008)
J. Am. Chem. Soc.
, vol.130
, pp. 14910-14911
-
-
Cao, P.G.1
Xu, K.2
Heath, J.R.3
-
70
-
-
84555178169
-
-NH- termination of the Si(111) surface by wet chemistry
-
Tian, F. Y.; Taber, D. F.; Teplyakov, A. V. -NH- termination of the Si(111) surface by wet chemistry J. Am. Chem. Soc. 2011, 133, 20769-20777
-
(2011)
J. Am. Chem. Soc.
, vol.133
, pp. 20769-20777
-
-
Tian, F.Y.1
Taber, D.F.2
Teplyakov, A.V.3
-
71
-
-
34147098455
-
Chemistry of diffusion barrier film formation: Adsorption and dissociation of tetrakis(dimethylamino)titanium on Si(100)-2 × 1
-
Rodriguez-Reyes, J. C. F.; Teplyakov, A. V. Chemistry of diffusion barrier film formation: adsorption and dissociation of tetrakis(dimethylamino) titanium on Si(100)-2 × 1 J. Phys. Chem. C 2007, 111, 4800-4808
-
(2007)
J. Phys. Chem. C
, vol.111
, pp. 4800-4808
-
-
Rodriguez-Reyes, J.C.F.1
Teplyakov, A.V.2
-
73
-
-
53549093568
-
Chemisorption of tetrakis(dimethylamido)titanium on Si(100)-2 × 1: C-H and C-N bond reactivity leading to low-temperature decomposition pathways
-
Rodriguez-Reyes, J. C. F.; Teplyakov, A. V. Chemisorption of tetrakis(dimethylamido)titanium on Si(100)-2 × 1: C-H and C-N bond reactivity leading to low-temperature decomposition pathways J. Phys. Chem. C 2008, 112, 9695-9705
-
(2008)
J. Phys. Chem. C
, vol.112
, pp. 9695-9705
-
-
Rodriguez-Reyes, J.C.F.1
Teplyakov, A.V.2
-
74
-
-
72449161536
-
Reversible tuning of the surface chemical reactivity of titanium nitride and nitride-carbide diffusion barrier thin films
-
Rodriguez-Reyes, J. C. F.; Ni, C. Y.; Bui, H. P.; Beebe, T. P., Jr.; Teplyakov, A. V. Reversible tuning of the surface chemical reactivity of titanium nitride and nitride-carbide diffusion barrier thin films Chem. Mater. 2009, 21, 5163-5169
-
(2009)
Chem. Mater.
, vol.21
, pp. 5163-5169
-
-
Rodriguez-Reyes, J.C.F.1
Ni, C.Y.2
Bui, H.P.3
Beebe T.P., Jr.4
Teplyakov, A.V.5
-
75
-
-
55249106908
-
Mechanisms of adsorption and decomposition of metal alkylamide precursors for ultrathin film growth
-
Rodriguez-Reyes, J. C. F.; Teplyakov, A. V. Mechanisms of adsorption and decomposition of metal alkylamide precursors for ultrathin film growth J. Appl. Phys. 2008, 104, 084907-1-084907-6
-
(2008)
J. Appl. Phys.
, vol.104
, pp. 0849071-0849076
-
-
Rodriguez-Reyes, J.C.F.1
Teplyakov, A.V.2
-
76
-
-
34547454855
-
Characterization of ultra-thin hafnium oxide films grown on silicon by atomic layer deposition using tetrakis(ethylmethyl-amino) hafnium and water precursors
-
Wang, Y.; Ho, M. T.; Goncharova, L. V.; Wielunski, L. S.; Rivillon-Amy, S.; Chabal, Y. J.; Gustafsson, T.; Moumen, N.; Boleslawski, M. Characterization of ultra-thin hafnium oxide films grown on silicon by atomic layer deposition using tetrakis(ethylmethyl-amino) hafnium and water precursors Chem. Mater. 2007, 19, 3127-3138
-
(2007)
Chem. Mater.
, vol.19
, pp. 3127-3138
-
-
Wang, Y.1
Ho, M.T.2
Goncharova, L.V.3
Wielunski, L.S.4
Rivillon-Amy, S.5
Chabal, Y.J.6
Gustafsson, T.7
Moumen, N.8
Boleslawski, M.9
-
78
-
-
20844441429
-
Atomic layer deposition of high-kappa dielectrics on nitrided silicon surfaces
-
Xu, Y.; Musgrave, C. B. Atomic layer deposition of high-kappa dielectrics on nitrided silicon surfaces Appl. Phys. Lett. 2005, 86, 192110-1-192110-3
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 1921101-1921103
-
-
Xu, Y.1
Musgrave, C.B.2
-
79
-
-
84863844382
-
Controlling the formation of metallic nanoparticles on functionalized silicon surfaces
-
Perrine, K. A.; Lin, J. M.; Teplyakov, A. V. Controlling the formation of metallic nanoparticles on functionalized silicon surfaces J. Phys. Chem. C 2012, 116, 14431-14444
-
(2012)
J. Phys. Chem. C
, vol.116
, pp. 14431-14444
-
-
Perrine, K.A.1
Lin, J.M.2
Teplyakov, A.V.3
-
80
-
-
77954918773
-
Metallic nanostructure formation limited by the surface hydrogen on silicon
-
Perrine, K. A.; Teplyakov, A. V. Metallic nanostructure formation limited by the surface hydrogen on silicon Langmuir 2010, 26, 12648-12658
-
(2010)
Langmuir
, vol.26
, pp. 12648-12658
-
-
Perrine, K.A.1
Teplyakov, A.V.2
|