Triethylamine on Si(001)-(2 × 1) at 300 K: Molecular adsorption and site configurations leading to dissociation

Journal of Physical Chemistry C

Volumn 116, Issue 31, 2012, Pages 16473-16486

  Naitabdi, Ahmed ^a,b,c   Bournel, Fabrice ^a,e   Gallet, Jean Jacques ^a,e   Markovits, Alexis ^d   Rochet, François ^a,e   Borensztein, Yves ^b   Silly, Mathieu G ^e   Sirotti, Fausto ^e  

^a Universit Pierre et Marie Curie Paris 6   (France)

^b INSTITUT DES NANOSCIENCES DE PARIS   (France)

^c UNITÉ DE CATALYSE ET DE CHIMIE DU SOLIDE   (France)

^d LABORATOIRE DE CHIMIE THÉORIQUE   (France)

^e SYNCHROTRON SOLEIL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION ENERGIES; BOND CLEAVAGES; CONSECUTIVE REACTION; CONVERSION REACTIONS; DATIVE BONDS; DENSITY FUNCTIONAL THEORY CALCULATIONS; EXPERIMENTAL CONDITIONS; EXPERIMENTAL DATA; GASPHASE; KINETIC MODELS; MOLECULAR ADSORPTION; MOLECULAR CONFORMATION; ROOM TEMPERATURE; SATURATION COVERAGE; SELF-ASSEMBLED; SELF-ORGANIZE; SI(0 0 1); SI-DIMER; SILICON SURFACES; STATIC BUCKLING; STM IMAGES; SURFACE SATURATION; TEMPLATING; TERTIARY AMINE; TRIETHYLAMINES; X-RAY PHOTOEMISSIONS; XPS MEASUREMENTS;

ADSORPTION; CHEMICAL BONDS; DENSITY FUNCTIONAL THEORY; DIMERS; DISSOCIATION; MOLECULES; SCANNING TUNNELING MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON;

EID: 84864984123     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp303002c     Document Type: Article

References (54)

1. Wolkow, R. A. Annu. Rev. Phys. Chem. 1999, 50, 413-441
2. Filler, M. A.; Bent, S. F. Prog. Surf. Sci. 2003, 73, 1-56
3. Yoshinobu, J. Prog. Surf. Sci. 2004, 77, 37-70
4. Murata, Y.; Kubota, M. Phase Transitions 1995, 53, 125-141
5. Ramstad, A.; Brocks, G.; Kelly, P. J. Phys. Rev. B 1995, 51, 14504-14523
6. Schlier, R. E.; Farnsworth, H. E. J. Chem. Phys. 1959, 30, 917-926
7. Chadi, D. J. Phys. Rev. Lett. 1979, 43, 43-47
8. Hamers, R. J.; Tromp, R. M.; Demuth, J. E. Phys. Rev. B 1986, 34, 5343-5357
9. Srivastava, G. P. Comput. Phys. Commun. 2001, 137, 143-162
10. Tochihara, H.; Amakusa, T.; Iwatsuki, M. Phys. Rev. B 1994, 50, 12262-12265
11. Wolkow, R. A. Phys. Rev. Lett. 1992, 68, 2636-2639
12. Widjaja, Y.; Mysinger, M. M.; Musgrave, C. B. J. Phys. Chem. B 2000, 104, 2527-2533
13. Cao, X. P.; Hamers, R. J. J. Am. Chem. Soc. 2001, 123, 10988-10996
14. Kato, T.; Kang, S. Y.; Xu, X.; Yamabe, T. J. Phys. Chem. B 2001, 105, 10340-10347
15. Carman, A. J.; Zhang, L. H.; Liswood, J. L.; Casey, S. M. J. Phys. Chem. B 2003, 107, 5491-5502
16. Cho, J. H.; Kleinman, L. Phys. Rev. B 2003, 68, 245314
17. Mui, C.; Wang, G. T.; Bent, S. F.; Musgrave, C. B. J. Chem. Phys. 2001, 114, 10170-10180
18. Hossain, M. Z.; Yamashita, Y.; Mukai, K.; Yoshinobu, J. Phys. Rev. B 2003, 68, 235322
19. Hossain, M. Z.; Machida, S.; Nagao, M.; Yamashita, Y.; Mukai, K.; Yoshinobu, J. J. Phys. Chem. B 2004, 108, 4737-4742
20. Mathieu, C. Phys. Rev. B 2009, 79, 205317
21. Mathieu, C. J. Phys. Chem. C 2009, 113, 11336-11345
22. Queeney, K. T.; Chabal, Y. J.; Raghavachari, K. Phys. Rev. Lett. 2001, 86, 1046-1049
23. Hossain, M. Z.; Machida, S.; Yamashita, Y.; Mukai, K.; Yoshinobu, J. J. Am. Chem. Soc. 2003, 125, 9252-9253
24. Hunter, E. P. L.; Lias, S. G. J. Phys. Chem. Ref. Data 1998, 27, 413-656
25. Bush, B.; Craig, J. H.; Roos, K. R.; Lozana, J.; Field, K. W. Surf. Interface Anal. 2008, 40, 927-930
26. Takeuchi, H.; Kojima, T.; Egawa, T.; Konaka, S. J. Phys. Chem. 1992, 96, 4389-4396
27. Murphy, W. F.; Zerbetto, F.; Duncan, J. L.; Mckean, D. C. J. Phys. Chem. 1993, 97, 581-595
28. Kresse, G.; Furthmuller, J. Phys. Rev. B 1996, 54, 11169-11186
29. Kresse, G.; Furthmuller, J. Comput. Mater. Sci. 1996, 6, 15-50
30. Kresse, G.; Hafner, J. Phys. Rev. B 1993, 47, 558-561
31. Kresse, G.; Hafner, J. Phys. Rev. B 1994, 49, 14251-14269
32. Blochl, P. E. Phys. Rev. B 1994, 50, 17953-17979
33. Kresse, G.; Joubert, D. Phys. Rev. B 1999, 59, 1758-1775
34. O'Mara, W. C.; Herring, R. B.; Hunt, L. P., Eds. Handbook of Semiconductor Silicon Technology; William Andrew Publishing: New York, 1990; pp 349-352.
35. Takahasi, M.; Nakatani, S.; Ito, Y.; Takahashi, T.; Zhang, X. W.; Ando, M. Surf. Sci. 1995, 338, L846-L850
36. Zhou, J. G.; Hagelberg, F.; Xiao, C. Y. Phys. Rev. B 2006, 73, 155307
37. Demirel, G.; Cakmak, M.; Caykara, T.; Ellialtioglu, S. J. Phys. Chem. C 2007, 111, 15020-15025
38. Jung, S. C.; Kang, M. H. Phys. Rev. B 2009, 80, 235312
39. Beamline Description. http://www.synchrotron-soleil.fr/Recherche/ LignesLumiere/TEMPO/DescriptionLigne.
40. Polack, F. AIP Conf. Proc. 2010, 1234, 185-188
41. Bergeard, N. J. Synchrotron Radiat. 2011, 18, 245-250
42. Coustel, R.; Carniato, S.; Boureau, G. J. Chem. Phys. 2011, 134, 234708
43. Cao, X. P.; Hamers, R. J. J. Vac. Sci. Technol., B 2002, 20, 1614-1619
44. Khaliq, A.; Pierucci, D.; Tissot, H.; Gallet, J. J.; Bournel, F.; Rochet, F.; Silly, M.; Sirotti, F. J. Phys. Chem. C 2012, 116, 12680-12686
45. Wilson, H. F.; Marks, N. A.; McKenzie, D. R. Surf. Sci. 2005, 587, 185-192
46. Hossain, M. Z.; Mukai, K.; Yamashita, Y.; Kawai, H.; Yoshinobu, J. Chem. Commun. 2011, 47, 10392-10394
47. Cho, J. H.; Kim, K. S.; Lee, S. H.; Kang, M. H. Phys. Rev. B 2000, 61, 4503-4506
48. Hossain, M. Z.; Yamashita, Y.; Mukai, K.; Yoshinobu, J. Phys. Rev. B 2003, 67, 153307
49. Konecny, R.; Doren, D. J. J. Chem. Phys. 1997, 106, 2426-2435
50. Raghavachari, K.; Chabal, Y. J.; Struck, L. M. Chem. Phys. Lett. 1996, 252, 230-235
51. Okano, S.; Oshiyama, A. Surf. Sci. 2004, 554, 272-279
52. Yu, S. Y.; Kim, H.; Koo, J. Y. Phys. Rev. Lett. 2008, 100, 036107
53. Yokoyama, T.; Takayanagi, K. Phys. Rev. B 1997, 56, 10483-10487
54. Shido, T.; Yamaguchi, A.; Asakura, K.; Iwasawa, Y. J. Mol. Catal. A: Chem. 2000, 163, 67-77