New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 1, 2013, Pages

  Thomas, Matthew A ^a,b   Armstrong, Johnathan C ^a   Cui, Jingbiao ^a  

^a University of Arkansas at Little Rock ^*  (United States)

^b STETSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO; HYDROGEN PLASMAS; TRANSPARENT CONDUCTIVE OXIDES; ZNO; ZNO FILMS;

ELECTRIC PROPERTIES; METALLIC FILMS; TRANSPARENCY; VAPORS; VOLTAGE DIVIDERS; ZINC OXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84871861730     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4768172     Document Type: Article

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