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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 1, 2012, Pages

Atomic layer deposition of Al-doped ZnO films using ozone as the oxygen source: A comparison of two methods to deliver aluminum

(6) Yuan, Hai a,b Luo, Bing a Yu, Dan a Cheng, An Jen a Campbell, Stephen A a Gladfelter, Wayne L a

a University of Minnesota (United States)

b NORTHWESTERN POLYTECHNICAL UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

AL-CONCENTRATION; AL-DOPED ZNO; ALUMINUM CONCENTRATION; ALUMINUM-DOPED ZNO; CARBON CONCENTRATIONS; CO-INJECTION; DEPOSITION METHODS; DEPTH PROFILE; DETECTION LIMITS; DIETHYLZINC; ELECTRICAL AND OPTICAL PROPERTIES; FILM COMPOSITION; HOMOGENEOUS DISTRIBUTION; LAYERED MICROSTRUCTURE; OXYGEN SOURCES; SURFACE LAYERS; TRIMETHYLALUMINUM; ZN DEPOSITION; ZNO FILMS;

ALUMINUM; ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; AUGER ELECTRON SPECTROSCOPY; CARBON FILMS; ELECTRIC PROPERTIES; FILM PREPARATION; METALLIC FILMS; OPTICAL PROPERTIES; OZONE; ZINC OXIDE;

OPTICAL FILMS;

EID: 84855604777 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3666030 Document Type: Article

Times cited : (36)

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