SCOPUS 정보 검색 플랫폼

Volumn 519, Issue 2, 2010, Pages 747-750

Deposition of Al doped ZnO layers with various electrical types by atomic layer deposition

(3) Ahn, Cheol Hyoun a Kim, Hyoungsub a Cho, Hyung Koun a

Author keywords

AlZnO; Atomic layer deposition; Electrical properties; Optical properties; Structural properties; Ternary oxides; Thin films; Transparent conducting oxide

Indexed keywords

ALZNO; ATOMIC LAYER; ELECTRICAL PROPERTY; TERNARY OXIDES; TRANSPARENT CONDUCTING OXIDE;

ALUMINUM; ATOMIC LAYER DEPOSITION; ATOMS; CONDUCTIVE FILMS; DEPOSITION; ELECTRIC CONDUCTIVITY; OXIDE FILMS; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

OPTICAL PROPERTIES;

EID: 77958450114 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.08.151 Document Type: Article

Times cited : (49)

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