The impact on in-situ-hydrogen-plasma treatment for zinc oxide plasma enhanced atomic layer deposition

Current Applied Physics

Volumn 12, Issue SUPPL. 2, 2012, Pages

  Kwon, Jung Dae ^a   Lee, Jae Won ^b   Nam, Kee Seok ^a   Kim, Dong Ho ^a   Jeong, Yongsoo ^a   Kwon, Se Hun ^c   Park, Jin Seong ^b  

^a Korea Institute of Material Science   (South Korea)

^b Dankook University   (South Korea)

^c Pusan National University   (South Korea)

Author keywords

Hydrogen plasma; Plasma enhance atomic layer deposition; ZnO

Indexed keywords

CONDUCTING PROPERTIES; CRYSTALLINITIES; FILM CRYSTALLINITY; FILM RESISTIVITY; HYDROGEN AND OXYGEN PLASMA; HYDROGEN PLASMAS; HYDROXYL GROUPS; LOW DEPOSITION TEMPERATURE; OXYGEN PLASMAS; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; ZNO; ZNO FILMS;

ATOMIC LAYER DEPOSITION; AUGER ELECTRON SPECTROSCOPY; CARRIER CONCENTRATION; ELECTRIC PROPERTIES; FILM GROWTH; HYDROGEN; METALLIC FILMS; OXYGEN; OXYGEN VACANCIES; PHOTOELECTRONS; PLASMA APPLICATIONS; VOLTAGE DIVIDERS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

PLASMAS;

EID: 84867495048     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2012.02.044     Document Type: Conference Paper

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