Effects of pulse bias on structure and properties of silicon/nitrogen- incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition

Applied Surface Science

Volumn 264, Issue , 2013, Pages 625-632

  Nakazawa, Hideki ^a   Miura, Soushi ^a   Kamata, Ryosuke ^a   Okuno, Saori ^a   Suemitsu, Maki ^b   Abe, Toshimi ^c  

^a HIROSAKI UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c TOHOKU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Chemical vapor deposition; Diamond like carbon; Nitrogen; Silicon

Indexed keywords

ADHESION; BOND STRENGTH (MATERIALS); CARBON FILMS; CHEMICAL VAPOR DEPOSITION; DIAMONDS; FILM PREPARATION; FRICTION; NITROGEN; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SUBSTRATES; WEAR RESISTANCE;

AMBIENT AIR; DIAMOND LIKE CARBON; FRICTION COEFFICIENTS; HEXAMETHYLDISILAZANE; MECHANICAL AND TRIBOLOGICAL PROPERTIES; RADIO FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; SILICON SUBSTRATES; STRUCTURE AND PROPERTIES;

DIAMOND LIKE CARBON FILMS;

EID: 84870506445     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.10.082     Document Type: Article

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