Characteristics of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition

Japanese Journal of Applied Physics

Volumn 51, Issue 1, 2012, Pages

  Nakazawa, Hideki ^a   Miura, Soushi ^a   Kamata, Ryosuke ^a   Okuno, Saori ^a   Enta, Yoshiharu ^a   Suemitsu, Maki ^b   Abe, Toshimi ^c  

^a HIROSAKI UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c TOHOKU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIAMOND-LIKE CARBON; DLC FILM; FRICTION COEFFICIENTS; HEXAMETHYLDISILAZANE; INTERNAL STRESS; MECHANICAL AND TRIBOLOGICAL PROPERTIES; MONOMETHYLSILANE; N INCORPORATION; RADIO FREQUENCIES; SI SOURCES; WEAR RATES;

ADHESION; ARGON; CHEMICAL VAPOR DEPOSITION; DIAMOND LIKE CARBON FILMS; FILM PREPARATION; FRICTION; METHANE; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; WEAR RESISTANCE;

CARBON FILMS;

EID: 84863404049     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.51.015603     Document Type: Article

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