Compositional, structural and optical properties of Si-rich a-SiC:H thin films deposited by ArF-LCVD

Applied Surface Science

Volumn 248, Issue 1-4, 2005, Pages 113-117

  Lopez E ^a   Chiussi, S ^a   Kosch, U ^a   Gonzalez P ^a   Serra, J ^a   Serra, C ^a   Leon B ^a  

^a UNIVERSITY OF VIGO   (Spain)

Author keywords

a SiC:H; Bandgap tailoring; FTIR; LCVD; Thin films; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPOSITION; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER APPLICATIONS; OPTICAL PROPERTIES; PROFILOMETRY; SILICON; SUBSTRATES; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS HYDROGENATED SILICON CARBON (A-SIC:H); BANDGAP TAILORING; GLASS SUBSTRATES; LASER INDUCED CHEMICAL VAPOR DEPOSITION (LCVD);

THIN FILMS;

EID: 19944362508     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.03.011     Document Type: Conference Paper

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