The structure, surface topography and mechanical properties of Si-C-N films fabricated by RF and DC magnetron sputtering

Applied Surface Science

Volumn 258, Issue 4, 2011, Pages 1328-1336

  Shi, Zhifeng ^a   Wang, Yingjun ^a   Du, Chang ^a   Huang, Nan ^b   Wang, Lin ^a   Ning, Chengyun ^a  

^a SOUTH CHINA UNIVERSITY OF TECHNOLOGY   (China)

^b SOUTHWEST JIAOTONG UNIVERSITY   (China)

Author keywords

Chemical bonding configuration; Magnetron sputtering; Nano indentation and tribological; Silicon carbon nitride

Indexed keywords

ATOMIC FORCE MICROSCOPY; BINARY ALLOYS; CARBON FILMS; CARBON NITRIDE; CHEMICAL BONDS; COATINGS; COBALT ALLOYS; HARDNESS; INDENTATION; ION BOMBARDMENT; MAGNETRON SPUTTERING; NITRIDES; SILICON ALLOYS; SURFACE TOPOGRAPHY; THIN FILMS; TOPOGRAPHY; TRIBOLOGY; WEAR RESISTANCE; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL BONDING CONFIGURATION; DC MAGNETRON SPUTTERING; DIRECT CURRENT MAGNETRON SPUTTERING; MECHANICAL AND TRIBOLOGICAL PROPERTIES; NANOINDENTATION TECHNIQUES; RF-MAGNETRON SPUTTERING; SILICON CARBON NITRIDE; TRIBOLOGICAL CHARACTERIZATION;

CHROMIUM ALLOYS;

EID: 81555202492     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.09.036     Document Type: Article

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