Effects of substrate bias voltage on structural, mechanical and tribological properties of diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition using methane and argon gases

Japanese Journal of Applied Physics

Volumn 47, Issue 1, 2008, Pages 231-236

  Nakazawa, Hideki ^a   Katoh, Shigeki ^a   Asai, Yuhki ^a   Mashita, Masao ^a  

^a HIROSAKI UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Diamond like carbon; Fourier transform infrared spectroscopy; Mechanical and tribological properties; Raman spectroscopy; X ray photoelectron spectroscopy

Indexed keywords

ARGON; DIAMONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRIBOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

SUBSTRATE BIAS VOLTAGE; TRIBOLOGICAL PROPERTIES;

CARBON FILMS;

EID: 38549100106     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.231     Document Type: Article

References (30)

1. Y. Liu, A. Erdemir, and E. I. Meletis: Surf. Coat. Technol. 82 (1996) 48.
2. J. Meneve and E. Dekemperneer: Diamond Films Technol. 4 (1994) 662.
3. Y. Nishimura, R. Ohkawa, H. Oka, H. Akamatsu, K. Azuma, and M. Yatsuzuka: Nucl. Instrum. Methods Phys. Res., Sect. B 206 (2003) 696.
4. W. Zhang, A. Tanaka, K. Wazumi, and Y. Koga: Diamond Relat. Mater. 11 (2002) 1837.
5. J. W. Zou, K. Reicelt, K. Schmit, and B. Dischler: J. Appl. Phys. 65 (1989) 3914.
6. O. Durand-Drouhin, M. Lejeune, and M. Benlahsen: J. Appl. Phys. 91 (2002) 867.
7. G. Cicala, P. Bruno, A. M. Losacco, and G. Mattei: Surf. Coat. Technol. 180-181 (2004) 222.
8. W. Zhang, A. Tanaka, K. Wazumi, and Y. Koga: Thin Solid Films 416 (2002) 145
9. A. C. Ferrari and J. Robertson: Phys. Rev. B 61 (2000) 14095.
10. R. Al-Jishi and G. Dresselhaus: Phys. Rev. B 26 (1982) 4514.
11. F. Sette, G. K. Werthem, Y. Ma, G. Meigs, S. Modesti, and C. T. Chen: Phys. Rev. B 41 (1990) 9766.
12. B. Marchon, J. Gui, K. Grannen, G. C. Rauch, J. W. Ager, S. R. P. Silva, and J. Robertson: IEEE Trans. Magn. 33 (1997) 3148.
13. T. Mikami, H. Nakazawa, M. Kudo, and M. Mashita: Thin Solid Films 488 (2005) 87.
14. M. Chhowalla, A. C. Ferrari, J. Robertson, and G. A. J. Amaratunga: Appl. Phys. Lett. 76 (2000) 1419.
15. S. R. Sails, D. J. Gardiner, M. Bowden, J. Savage, and D. Rodway: Diamond Relat. Mater. 5 (1996) 589.
16. K. Yamamoto, Y. Koga, S. Fujiwara, F. Kokai, and R. B. Heimann: Appl. Phys. A 66 (1998) 115.
17. M. Tabbal, P. Merel, M. Chaker, M. A. El Khakani, E. G. Herbert, B. N. Lucas, and M. E. O'Hern; J. Appl. Phys. 85 (1999) 3860.
18. E. Riedo, F. Comin, J. Chevrier, F. Schmithusen, S. Decossas, and M. Sancrotti: Surf. Coat. Technol. 125 (2000) 124.
19. P. Merel, M. Tabbal, M. Chaker, S. Moisa, and J. Margot: Appl. Surf. Sci. 136 (1998) 105.
20. J. Diaz, G. Paolicelli, S. Ferrer, and F. Comin: Phys. Rev. B 54 (1996) 8064.
21. Z. Di, A. Huang, R. K. Y. Fu, P. K. Chu, L. Shao, T. Hoechbauer, M. Nastasi, M. Zhang, W. Liu, Q. Shen, S. Luo, Z. Song, and C. Lin: J. Appl. Phys. 98 (2005) 053502.
22. D. J. Li, F. Z. Cui, and H. Q. Gu: Appl. Surf. Sci. 137 (1999) 30.
23. Y. Mizokawa, T. Miyasato, S. Nakamura, K. M. Geib, and C. W. Wilmsen: J. Vac. Sci. Technol. A 5 (1987) 2809.
24. N. Mutsukura, S. Inoue, and Y. Machi: J. Appl. Phys. 72 (1992) 43.
25. E. Gogolides, D. Mary, A. Rhallabi, and G. Turban: Jpn. J. Appl. Phys. 34 (1995) 261.
26. C. Casiraghi, A. C. Ferrari, and J. Robertson: Phys. Rev. B 72 (2005) 085401.
27. P. Hammer, N. M. Victoria, and F. Alvarez: J. Vac. Sci. Technol. A 16 (1998) 2941.
28. M. K. Fung, W. C. Chan, K. H. Lai, I. Bello, C. S. Lee, N. B. Wong, and S. T. Lee: J. Non-Cryst. Solids 254 (1999) 167.
29. A. Erdemir, O. L. Eryilmaz, I. B. Nilufer, and G. R. Fenske: Diamond Relat. Mater. 9 (2000) 632.
30. A. Erdemir: Surf. Coat. Technol. 146-147 (2001) 292.