Improved high-temperature stability of Si incorporated a-C:H films

Diamond and Related Materials

Volumn 7, Issue 8, 1998, Pages 1155-1162

  Camargo Jr , S S ^a   Neto, A L Baia ^a,b   Santos, R A ^a   Freire Jr , F L ^c   Carius, R ^d   Finger, F ^d  

^a Unlversldade Federal do Rio de Janeiro   (Brazil)

^b FEDERAL RURAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^c PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^d FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

a C:H films; High temperature stability; Silicon

Indexed keywords

AMORPHOUS FILMS; CARBON; ELECTRON SPIN RESONANCE SPECTROSCOPY; GRAPHITIZATION; SILICON; THERMODYNAMIC STABILITY;

CARBON FILMS; DIAMOND-LIKE FILMS;

DIAMOND FILMS;

EID: 0032140329     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00165-4     Document Type: Article

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