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Journal of Alloys and Compounds

Volumn 487, Issue 1-2, 2009, Pages 531-536

IR studies of SiCN films deposited by RF sputtering method

(5) Chen, Zhiyong a Lin, Hongfeng a Zhou, Jinyuan a Ma, Ziwei a Xie, Erqing a

a LANZHOU UNIVERSITY (China)

Author keywords

AFM; IR; Radio frequency (RF); SiCN film; XPS

Indexed keywords

AFM; IR; RADIO-FREQUENCY (RF); SICN FILM; XPS;

ATOMIC FORCE MICROSCOPY; BOND STRENGTH (CHEMICAL); CARBON FILMS; CRYSTAL ATOMIC STRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITRIDES; NITROGEN; SILICON; SILICON CARBIDE; SPECTROSCOPIC ANALYSIS; SPECTROSCOPY; STOICHIOMETRY; SUBSTRATES; SURFACE STRUCTURE;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 70350618759 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2009.08.009 Document Type: Article

Times cited : (29)

References (21)

1
- 20444373328
- Liu A.Y., and Cohen M.L. Science 245 (1989) 841-845
- (1989) Science , vol.245 , pp. 841-845
- Liu, A.Y.¹ Cohen, M.L.²

2
- 0042059097
- Liu A.Y., and Cohen M.L. Phys. Rev. B 41 (1990) 10727-10734
- (1990) Phys. Rev. B , vol.41 , pp. 10727-10734
- Liu, A.Y.¹ Cohen, M.L.²

3
- 0342945364
- Sjostrom H., Stafstrom S., Boman M., and Sundgren J.-E. Phys. Rev. Lett. 75 (1995) 1336-1339
- (1995) Phys. Rev. Lett. , vol.75 , pp. 1336-1339
- Sjostrom, H.¹ Stafstrom, S.² Boman, M.³ Sundgren, J.-E.⁴

4
- 0035500660
- Shi W., Wu J.D., Sun J., Ling H., Ying Z.F., Ding X.M., Zhou Z.Y., and Li F.M. Appl. Phys. A 73 (2001) 605-608
- (2001) Appl. Phys. A , vol.73 , pp. 605-608
- Shi, W.¹ Wu, J.D.² Sun, J.³ Ling, H.⁴ Ying, Z.F.⁵ Ding, X.M.⁶ Zhou, Z.Y.⁷ Li, F.M.⁸

5
- 0034731751
- Chen L.C., Wu C.T., Wu J.J., and Chen C.K. Int. J. Mod. Phys. B 14 (2000) 333-348
- (2000) Int. J. Mod. Phys. B , vol.14 , pp. 333-348
- Chen, L.C.¹ Wu, C.T.² Wu, J.J.³ Chen, C.K.⁴

6
- 0000087287
- Bendeddouche A., Berjoan R., Beche E., Merle-Mejean T., Schamm S., Serin V., Taillades G., Pradel A., and Hillel R. J. Appl. Phys. 81 (1997) 6147-6154
- (1997) J. Appl. Phys. , vol.81 , pp. 6147-6154
- Bendeddouche, A.¹ Berjoan, R.² Beche, E.³ Merle-Mejean, T.⁴ Schamm, S.⁵ Serin, V.⁶ Taillades, G.⁷ Pradel, A.⁸ Hillel, R.⁹

7
- 0342620671
- Chen L.C., Chen C.K., Wei S.L., Bhusari D.M., Chen K.H., Chen Y.F., Jong Y.C., and Huang Y.S. Appl. Phys. Lett. 72 (1998) 2463-2465
- (1998) Appl. Phys. Lett. , vol.72 , pp. 2463-2465
- Chen, L.C.¹ Chen, C.K.² Wei, S.L.³ Bhusari, D.M.⁴ Chen, K.H.⁵ Chen, Y.F.⁶ Jong, Y.C.⁷ Huang, Y.S.⁸

8
- 0033313358
- Chen L.C., Chen K.H., Wei S.L., Kichambare P.D., Wu J.J., Lu T.R., and Kuo C.T. Thin Solid Films 355-356 (1999) 112-116
- (1999) Thin Solid Films , vol.355-356 , pp. 112-116
- Chen, L.C.¹ Chen, K.H.² Wei, S.L.³ Kichambare, P.D.⁴ Wu, J.J.⁵ Lu, T.R.⁶ Kuo, C.T.⁷

9
- 0034509127
- Gao Y., Wei J., Zhang D.H., Mo Z.Q., Hing P., and Shi X. Thin Solid Films 377-378 (2000) 562-566
- (2000) Thin Solid Films , vol.377-378 , pp. 562-566
- Gao, Y.¹ Wei, J.² Zhang, D.H.³ Mo, Z.Q.⁴ Hing, P.⁵ Shi, X.⁶

10
- 0035449795
- Yamamoto K., Koga Y., and Fujiwara S. Diamond Relat. Mater. 10 (2001) 1921-1926
- (2001) Diamond Relat. Mater. , vol.10 , pp. 1921-1926
- Yamamoto, K.¹ Koga, Y.² Fujiwara, S.³

11
- 0038687176
- Xie E.Q., Ma Z.W., Lin H.F., Zhang Z.M., and He D.Y. Opt. Mater. 23 (2003) 151-156
- (2003) Opt. Mater. , vol.23 , pp. 151-156
- Xie, E.Q.¹ Ma, Z.W.² Lin, H.F.³ Zhang, Z.M.⁴ He, D.Y.⁵

12
- 36448999356
- Zhang Z.J., Fan S., and Lieber C.M. Appl. Phys. Lett. 66 (1995) 3582-3584
- (1995) Appl. Phys. Lett. , vol.66 , pp. 3582-3584
- Zhang, Z.J.¹ Fan, S.² Lieber, C.M.³

13
- 21344491621
- Li D., Chung Y.W., Yang S., Wong M.-S., Adibi F., and Sproul W.D. J. Vac. Sci. Technol. A 12 (1994) 1470-1473
- (1994) J. Vac. Sci. Technol. A , vol.12 , pp. 1470-1473
- Li, D.¹ Chung, Y.W.² Yang, S.³ Wong, M.-S.⁴ Adibi, F.⁵ Sproul, W.D.⁶

14
- 0038554612
- Besling W.F.A., Goossens A., Meester B., and Schoonman J. J. Appl. Phys. 83 (1998) 544-553
- (1998) J. Appl. Phys. , vol.83 , pp. 544-553
- Besling, W.F.A.¹ Goossens, A.² Meester, B.³ Schoonman, J.⁴

15
- 0026374593
- Zhang W., and Wang J.T. Surf. Coat. Technol. 50 (1991) 11-15
- (1991) Surf. Coat. Technol. , vol.50 , pp. 11-15
- Zhang, W.¹ Wang, J.T.²

16
- 0035501507
- Wu J.Y., Kuo C.T., and Yang P. J. Mater. Chem. Phys. 72 (2001) 245-250
- (2001) J. Mater. Chem. Phys. , vol.72 , pp. 245-250
- Wu, J.Y.¹ Kuo, C.T.² Yang, P.³

17
- 70350618103
- Gao P., Xu J., Piao Y., Ding W.Y., Wang D.H., Deng X.L., and Dong C.H. Surf. Coat. Technol. 201 (2007) 9-11
- (2007) Surf. Coat. Technol. , vol.201 , pp. 9-11
- Gao, P.¹ Xu, J.² Piao, Y.³ Ding, W.Y.⁴ Wang, D.H.⁵ Deng, X.L.⁶ Dong, C.H.⁷

18
- 33646886858
- Du X.W., Fu Y., Sun J., and Yao P. J. Appl. Phys. 99 (2004) 093503
- (2004) J. Appl. Phys. , vol.99 , pp. 093503
- Du, X.W.¹ Fu, Y.² Sun, J.³ Yao, P.⁴

19
- 67349262773
- Bhattacharyya A.S., Mishra S.K., Mukherjee S., and Das G.C. J. Alloys Compd. 478 (2009) 474-478
- (2009) J. Alloys Compd. , vol.478 , pp. 474-478
- Bhattacharyya, A.S.¹ Mishra, S.K.² Mukherjee, S.³ Das, G.C.⁴

20
- 0002561777
- Xiao X.C., Li Y.W., Song L.X., Peng X.F., and Hu X.F. Appl. Surf. Sci. 156 (2000) 155-160
- (2000) Appl. Surf. Sci. , vol.156 , pp. 155-160
- Xiao, X.C.¹ Li, Y.W.² Song, L.X.³ Peng, X.F.⁴ Hu, X.F.⁵

21
- 70350621920
- Nalwa H.S. (Ed), Academic Press, New York
- Chen L.C., Chen K.H., Wu J.J., Bhusari D.M., and Lin M.C. In: Nalwa H.S. (Ed). Silicon-Based Material and Devices. 1: Materials and Processing (2001), Academic Press, New York 88
- (2001) Silicon-Based Material and Devices. 1: Materials and Processing , pp. 88
- Chen, L.C.¹ Chen, K.H.² Wu, J.J.³ Bhusari, D.M.⁴ Lin, M.C.⁵

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