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Volumn 112, Issue 7, 2012, Pages

Stress-induced leakage current and trap generation in HfO 2 thin films

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION CURRENTS; ANALYTICAL EXPRESSIONS; ARRHENIUS LAW; CURRENT-TIME CHARACTERISTICS; DEFECTS CONTROL; ELECTRON IMPACT; ELECTRON TRAPPING; EXPONENTIAL LAW; FIRST ORDER KINETICS; FOWLER-NORDHEIM LAW; HOPPING CONDUCTION; METAL INSULATOR METAL CAPACITOR (MIM); OXYGEN IONS; QUASI-LINEAR; ROOM TEMPERATURE; STRESS-INDUCED LEAKAGE CURRENT; TEMPERATURE DEPENDENCE; THERMAL BREAKDOWN; TRAP GENERATION;

EID: 84867559493     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4756993     Document Type: Article
Times cited : (46)

References (39)
  • 19
    • 80655128582 scopus 로고    scopus 로고
    • 10.1063/1.3651087
    • S. K. Sahoo and D. Misra, J. Appl. Phys. 110, 084104 (2011). 10.1063/1.3651087
    • (2011) J. Appl. Phys. , vol.110 , pp. 084104
    • Sahoo, S.K.1    Misra, D.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.