Direct visualization and in-depth physical study of metal filament formation in percolated high- κ dielectrics

Applied Physics Letters

Volumn 96, Issue 2, 2010, Pages

  Li, X ^a,b   Pey, K L ^a   Bosman, M ^b   Liu, W H ^a   Kauerauf, T ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

^c IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DIRECT VISUALIZATION; GATE ELECTRODES; GATE STACKS; HIGH CURRENTS; METAL FILAMENTS; NANOSCALE METALS; PHYSICAL DEFECTS; RELIABILITY MARGIN; TRANSMISSION ELECTRON; ULTRA-FAST;

FILAMENTS (LAMP); GATES (TRANSISTOR); LOGIC GATES; METALS; TANTALUM; TRANSMISSION ELECTRON MICROSCOPY;

GATE DIELECTRICS;

EID: 74549193388     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3291621     Document Type: Article

References (10)

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