TiNx/ HfO2 interface dipole induced by oxygen scavenging

Applied Physics Letters

Volumn 98, Issue 13, 2011, Pages

  Afanas'ev, V V ^a   Stesmans, A ^a   Pantisano, L ^b,c   Cimino, S ^b   Adelmann, C ^c   Goux, L ^c   Chen, Y Y ^c,d   Kittl, J A ^c   Wouters, D ^c,d   Jurczak, M ^c  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c IMEC   (Belgium)

^d Katholieke Universiteit Leuven   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER HEIGHTS; ELECTRODE MATERIAL; ELECTRON BARRIER; INTERFACE DIPOLE; INTERNAL PHOTOEMISSION; METAL ELECTRODE SURFACE; METAL-INSULATOR-METAL STRUCTURES; OXYGEN SCAVENGING; POSITIVE CHARGES;

HAFNIUM; HAFNIUM COMPOUNDS; METAL INSULATOR BOUNDARIES; OXYGEN; SCAVENGING; TITANIUM NITRIDE;

ELECTROCHEMICAL ELECTRODES;

EID: 79953747596     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3570647     Document Type: Article

References (19)

1. B. E. Deal, E. H. Snow, and C. A. Mead, J. Phys. Chem. Solids 0022-3697 27, 1873 (1966). 10.1016/0022-3697(66)90118-1
2. V. V. Afanas'ev, M. Houssa, A. Stesmans, and M. M. Heyns, J. Appl. Phys. 0021-8979 91, 3079 (2002). 10.1063/1.1436299 (Pubitemid 34598779)
3. V. V. Afanas'ev and A. Stesmans, J. Appl. Phys. 0021-8979 102, 081301 (2007). 10.1063/1.2799091
4. J. Tersoff, Phys. Rev. B 0556-2805 32, 6968 (1985). 10.1103/PhysRevB.32. 6968
5. W. Mönch, J. Vac. Sci. Technol. B 1071-1023 17, 1867 (1999). 10.1116/1.590839
6. W. Mönch, J. Appl. Phys. 0021-8979 107, 013706 (2010). 10.1063/1.3275051
7. J. Robertson, J. Vac. Sci. Technol. B 1071-1023 18, 1785 (2000) 10.1116/1.591472
8. J. Robertson, Rep. Prog. Phys. 0034-4885 69, 327 (2006). 10.1088/0034-4885/69/2/R02 (Pubitemid 43121643)
9. C. L. Hinkle, R. V. Galatege, R. A. Chapman, E. M. Vogel, H. M. Alshareef, C. Freeman, E. Wimmer, H. Niimi, A. Li-Fatou, J. B. Shaw, and J. J. Chambers, Appl. Phys. Lett. 0003-6951 96, 103502 (2010). 10.1063/1.3353993
10. R. Y. Tung, Phys. Rev. Lett. 0031-9007 84, 6078 (2000) 10.1103/PhysRevLett.84.6078
11. R. Y. Tung, Mater. Sci. Eng. R. 0927-796X 35, 1 (2001). 10.1016/S0927-796X(01)00037-7
12. See, e.g., M. Houssa, L. Pantisano, L. -A. Ragnarsson, R. Degraeve, T. Schram, G. Pourtois, S. De Gendt, G. Groeseneken, and M. M. Heyns, Mater. Sci. Eng. R. 0927-796X 51, 37 (2006). 10.1016/j.mser.2006.04.001 (Pubitemid 43783301)
13. V. V. Afanas'ev, A. Stesmans, L. Pantisano, and T. Schram, Appl. Phys. Lett. 0003-6951 86, 232902 (2005). 10.1063/1.1935041 (Pubitemid 40890884)
14. P. -S. Chen, H. -Y. Lee, Y. -S. Chen, P. -Y. Gu, F. Chen, and M. -J. Tsai, Electrochem. Solid-State Lett. 1099-0062 13, H423 (2010). 10.1149/1.3489079
15. V. V. Afanas'ev, Internal Photoemission Spectroscopy (Elsevier, Amsterdam, 2008).
16. R. J. Powell, J. Appl. Phys. 0021-8979 41, 2424 (1970). 10.1063/1.1659238
17. V. V. Afanas'ev, A. Stesmans, A. Chen, F. Shi, and S. A. Campbell, Appl. Phys. Lett. 0003-6951 81, 1053 (2002). 10.1063/1.1495088 (Pubitemid 34945766)
18. P. S. Lysaght, J. C. Woicik, M. A. Sahiner, B. H. Lee, and R. Jammy, Appl. Phys. Lett. 0003-6951 91, 122910 (2007). 10.1063/1.2789180 (Pubitemid 47461928)
19. E. E. Hoppe, R. S. Sorbello, and C. R. Aita, J. Appl. Phys. 0021-8979 101, 123534 (2007). 10.1063/1.2750406 (Pubitemid 47158122)