Effect of postdeposition annealing on the structure, composition, and the mechanical and Optical characteristics of niobium and tantalum oxide films

Applied Optics

Volumn 51, Issue 27, 2012, Pages 6498-6507

  Çetinörgö Goldenberg, Eda ^a,b   Klemberg Sapieha, Jolanta Ewa ^b   Martinu, Ludvik ^b  

^a TEL AVIV UNIVERSITY   (Israel)

^b ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ELASTIC MODULI; ELECTRONIC STRUCTURE; FILMS; INTERFACES (MATERIALS); ION BEAMS; NIOBIUM; NIOBIUM OXIDE; OPTICAL PROPERTIES; OXIDE FILMS; REFRACTIVE INDEX; SPUTTERING; SUBSTRATES; TANTALUM; TANTALUM OXIDES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ANNEALING TEMPERATURES; COMPOSITIONAL ANALYSIS; DUAL ION BEAM SPUTTERING; EFFECT OF ANNEALING; EXTINCTION COEFFICIENTS; FILM-SUBSTRATE INTERFACES; OPTICAL CHARACTERISTICS; POST DEPOSITION ANNEALING;

OPTICAL FILMS;

EID: 84866715743     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.51.006498     Document Type: Article

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