Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films

Crystal Research and Technology

Volumn 42, Issue 3, 2007, Pages 290-294

  Chandra, S V Jagadeesh ^a   Rao, G Mohan ^b   Uthann, S ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

Magnetron sputtering; Optical absorption; Structure; Tantalum oxide

Indexed keywords

CRYSTAL STRUCTURE; HEAT TREATMENT; LIGHT ABSORPTION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; TANTALUM COMPOUNDS;

CHEMICAL BINDING CONFIGURATION; TANTALUM OXIDE;

FILMS;

EID: 34547529120     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.200610815     Document Type: Article

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