Characteristics of some metallic oxides prepared in high vacuum by ion beam sputtering

Applied Surface Science

Volumn 171, Issue 1-2, 2001, Pages 151-156

  Lee, Cheng Chung ^a   Hsu, Jin Cherng ^a   Wong, Daw Heng ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; ION BEAMS; OXIDES; SPECTROPHOTOMETERS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS;

ION BEAM SPUTTERING; METALLIC OXIDES; OPTICAL CONSTANTS;

FILM PREPARATION;

EID: 0035254566     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00556-0     Document Type: Article

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