SCOPUS 정보 검색 플랫폼

Chemical Vapor Deposition

Volumn 4, Issue 1, 1998, Pages 29-34

Niobium Oxide Thin Films Grown by Atomic Layer Epitaxy

(4) Kukli, Kaupo a,b Ritala, Mikko a Leskelä, Markku a Lappalainen, Reijo a

a UNIVERSITY OF HELSINKI (Finland)

b UNIVERSITY OF TARTU (Estonia)

Author keywords

Atomic layer epitaxy; Dielectrics; Niobium; Niobium oxide; Thin films

Indexed keywords

EPITAXIAL GROWTH; FILM GROWTH; NIOBIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; THIN FILMS; WATER;

ATOMIC LAYER EPITAXY (ALE);

CHEMICAL VAPOR DEPOSITION;

EID: 0031701182 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(sici)1521-3862(199801)04:01<29::aid-cvde29>3.3.co;2-i Document Type: Article

Times cited : (78)

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