Simultaneous determination of the thermal expansion coefficient and the elastic modulus of Ta2O5 thin film using phase shifting interferometry

Journal of Modern Optics

Volumn 47, Issue 10, 2000, Pages 1681-1691

  Tien, Chuen Lin ^a,c   Jaing, Cheng Chung ^b   Lee, Cheng Chung ^a   Chuang, Kie Pin ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b National Science Council   (Taiwan)

^c CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC MODULI; MECHANICAL VARIABLES MEASUREMENT; POISSON RATIO; SPUTTER DEPOSITION; STRESSES; TANTALUM COMPOUNDS; THERMAL EFFECTS; THERMAL EXPANSION; THIN FILMS;

PHASE SHIFTING INTERFEROMETRY; STRESS MEASUREMENT TEMPERATURE; THERMAL EXPANSION COEFFICIENT;

INTERFEROMETRY;

EID: 0034664144     PISSN: 09500340     EISSN: None     Source Type: Journal    
DOI: 10.1080/09500340050080303     Document Type: Article

References (36)

1. Terui, H., and Kobayashi, M., 1978, Appl. Phys. Lett., 32, 666-668.
2. Takahashi, H.; Suzuki, S., and Nishi, I., 1994, J. Lightwave Technol., 12, 989-995.
3. Hensler, D. H.; Cuthbert, J. D.; Martin, R. J., and Tien, P. K., 1971, Appl. Opt., 10, 1037-1041.
4. Shinriki, H., and Nakata, M., 1991, IEEE Trans. Electron Devices, 38, 455-462.
5. Takahashi, H., 1995, Appl. Opt., 34, 667-675.
6. Zoller, A.; Gotzelmann, R.; Matl, K., and Cushing, D., 1996, Appl. Opt., 35, 5609-5612.
7. Fujii, Y., 1991, Opt. Lett., 16, 345-347.
8. Aboaf, J. A., 1969, J. Electrochem. Soc., 116, 1732-1736.
9. Sunami, H.; Itoch, Y., and Sato, K., 1970, J. Appl. Phys., 41, 5115-5117.
10. Blachman, A. G., 1971, Metal. Trans., 2, 699-709.
11. Irene, E. A., 1976, J. Electron. Mater., 5, 287-298.
12. Miyagi, M., and Funakoshi, N., 1981, Jpn. J. Appl. Phys., 20, 289-290.
13. Shimbo, M., and Matsuo, T., 1983, J. Electrochem. Soc., 130, 135-138.
14. Sinha, A. K.; Levinstein, H. J., and Smith, T. E., 1978, J. Appl. Phys., 49, 2423-2426.
15. Blaauw, C., 1983, J. Appl. Phys., 54, 5064-5068.
16. Pan, J. T., and Blech, I., 1984, J. Appl. Phys., 55, 2874-2880.
17. Williams, D. S., 1985, J. Appl. Phys., 57, 2340-2342.
18. Han, M. Y., and Jou, J. H., 1995, Thin Solid Films, 260, 58-64.
19. Tiwary, H. V., and Sao, G. D., 1981, J. Phys. E, 14, 1378-1380.
20. Snyder, C. R., and Mopsik, F. I., 1998, Rev. Sci. Instrum., 69, 3889-3895.
21. Ohring, M., 1992, The Materials Science of Thin Films (San Diego: Academic Press). p. 407.
22. Hollman, P.; Larsson, Hedenqvist, M. P., and Hogmark, S., 1997, Surf. Coat. Technol., 90, 234-238.
23. Rouzaud, A.; Barbier, E.; Ernoult, J., and Quesnel, E., 1995, Thin Solid Films, 270, 270-274.
24. Perry, A. J., Sue, J. A., and Martin, P. J., 1996, Surf. Coat. Technol., 81, 17-18.
25. Shinoda, T.; Soga, N.; Hanada, T., and Tanabe, S., 1997, Thin Solid Films, 293, 144-148.
26. Jade, S. A., and Smits, J. G., 1998, Proc. 1998 IEEE International Frequency Control Symposium, 783-789.
27. Schneider, D., and Schultrich, B., 1998, Surf. Coat. Technol., 98, 962-970.
28. Read, D. T., 1998, Meas. Sci. Technol., 9, 676-685.
29. Swanepoel, R., 1983, J. Phys. E., 16, 1214-1222.
30. Tien, C. L.; Lee, C. C. and Jaing, C. C., 2000, J. Mod. Opt., 47, 839-849.
31. Hariharan, P.; Oreb, B. F., and Eiju, T., 1987, Appl. Opt., 26, 2504-2506.
32. Stoney, G. G., 1909, Proc. R. Soc. London Ser. A, 82, 172-175.
33. Davidenkov, N. N., 1961, Sov. Phys.: Solid State, 2, 2595-2598.
34. Homan, R. W., 1966, Physics of Thin Films, edited by G. Hass and R. E. Thun (New York: Academic Press), Vol. 3, pp. 211-273.
35. Scobey, M. A., and Stupik, P., 1994, 37th Annual Technical Conference Proceedings, 47-52.
36. Chu, A. K.; Lin, H. C., and Cheng, W. H., 1997, J. Electro. Mater., 26, 889-892.