An apparatus for the measurement of internal stress and thermal expansion coefficient of metal oxide films

Review of Scientific Instruments

Volumn 72, Issue 4, 2001, Pages 2128-2133

  Lee, Cheng Chung ^a   Tien, Chuen Lin ^b   Sheu, Wean Shyang ^b   Jaing, Cheng Chung ^c  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c National Science Council   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040750440     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1357228     Document Type: Article

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