Temperature stability of sputtered niobium-oxide films

Journal of Applied Physics

Volumn 91, Issue 8, 2002, Pages 4863-4871

  Venkataraj, S ^a   Drese, R ^b   Liesch, Ch ^b   Kappertz, O ^b   Jayavel, R ^a   Wuttig, M ^c  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b ANNA UNIVERSITY   (India)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; BACKSCATTERING MEASUREMENT; CLAUSIUS-MOSSOTTI RELATION; ELECTRONIC-POLARIZABILITY; FILM DENSITY; OPTICAL SPECTROSCOPY; STRUCTURAL AND OPTICAL PROPERTIES; TEMPERATURE DEPENDENCE; TEMPERATURE STABILITY; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY; X RAY REFLECTION; X RAY REFLECTIVITY; X-RAY DIFFRACTION STUDIES;

ANNEALING; MOLECULAR ELECTRONICS; NIOBIUM; NIOBIUM OXIDE; OPTICAL CONSTANTS; OXIDE FILMS; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; STOICHIOMETRY; X RAY DIFFRACTION;

AMORPHOUS FILMS;

EID: 0037091509     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1458052     Document Type: Article

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