Structural, morphological and optical properties of nanocrystalline ZnO films deposited by RF sputtering at different bias voltages

Journal of Optoelectronics and Advanced Materials

Volumn 14, Issue 3-4, 2012, Pages 287-292

  Subba Reddy, R ^a   Sivasankar Reddy, A ^b   Uthanna, S ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b Kongju National University   (South Korea)

Author keywords

Optical properties; Sputtering; Structure; Thin films; ZnO films

Indexed keywords

ATOMIC FORCE MICROSCOPY; BIAS VOLTAGE; CRYSTAL ATOMIC STRUCTURE; ENERGY GAP; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; METALLIC FILMS; NANOCRYSTALS; OPACITY; OPTICAL PROPERTIES; OXIDE MINERALS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; STRUCTURE (COMPOSITION); SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE;

FOURIER TRANSFORM INFRARED SPECTRA; GLASS SUBSTRATES; NANOCRYSTALLINE ZNO; RF-MAGNETRON SPUTTERING; SUBSTRATE BIAS VOLTAGES; UV-VIS-NIR SPECTROPHOTOMETERS; ZNO FILMS; ZNO THIN FILM;

OPTICAL FILMS;

EID: 84863600720     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (30)

1. R. Hong, H. Wen, C. Liu, J. Chen, J. Liao, J. Cryst. Growth., 314, 30 (2011).
2. S. J. Kang, Y. H. Joung, Appl. Surf. Sci., 253, 7330 (2007).
3. S. Manjunatha, L. S. Panchakarla, K. Biswas C. N. R. Rao, Inorg. chimica Acta, 63, 2696 (2010).
4. M. Li, N. Choksi, R. L. Deleon, G. Tompa W. A. Anderson, Thin Solid Films, 515, 7357 (2007).
5. A. Umar, Nanoscale Res. Lett., 4, 1004 (2009).
6. Q. Wan and Q. H. Li, Appl. Phys. Lett., 84, 3654 (2004).
7. R. A. Asman, G. Ferbmtier, F. Maily, P. G. Borrut, A. Foucoran, Thin Solid Films 473, 49 (2005).
8. Z. Yin, N. Chen, R. Dai, L. Liu, X. Zhang, X. Wang, J. Lu and C. Chai, J. Cryst. Growth, 305, 296 (2007).
9. S. Kitova and G. Danov, J. Phys: Conf. Series, 223, 012022 (2010).
10. E. Senedim, H. Kavak and R Esen, J. Phys. Condens. Mater., 18, 6391 (2006).
11. Y. Zhao, Y. Jiang and Y. Fang, J. Cryst. Growth, 307, 278 (2007).
12. A. Y. Polykov, N. B. Smirnov, A. I. Belogorokhov, A. V. Govorkov A. Kozhukhova, J. Vac. Sci. Technol. B 25, 1794 (2007).
13. C. C. Ting, C. H. Li, C. Y. Kuo, C. C. Hsu, Thin Solid Films, 518, 4156 (2010).
14. Y. C. Lin, B. L. Wang, W. T. Yen, C. T. Ha, C. Peng, Thin Solid Films 518, 4928 (2010).
15. X. C. Wang, X. M. Chen, B. H. Yang, J. Alloys. Compounds, 488, 232 (2009).
16. Z. W. Yang, S. H. Han, T. L. Yang, L. Ye, D. H. Zhang, H. L. Ma, C. H. Chang, Thin Solid Films 366, 4 (2000).
17. V. Nirupama, M. Chandra Sekhar, P. Radhika, B. Sreedhar, S. Uthanna, J. Optoelectron. Adv. Mater., 11, 320 (2009).
18. A. Mallikharjuna Reddy, A. Sivasankar Reddy, P. Sreedhara Reddy, Mater. Chem. Phys., 125, 434 (2011).
19. H. Ma, X. Hao, J. Ma, Y. Yang, S. Huang, F. Chen, D. Zhang, Surf. Coat. Technol., 161, 58 (2002).
20. S. Flickyngerova, K. Shtereva, D. Hasko, I. Novotny, V. Tvarozek, P. Sutta, E. Vavrinsky, Appl. Surf. Sci., 254, 3643 (2008).
21. M. C. Barnes, S. Kumar, L. Green, M. N. Wang, A. R. Gerson, Surf. Coat. Technol. 190, 321 (2005).
22. S. J. Kang and Y. H. Young, Appl. Surf. Sci., 253, 7330 (2007).
23. B. D. Cullity, Elements of X-ray Diffraction, 2nd Ed., Addison Wesley, London, 1978.
24. S. Lalita, R. Sathyamurthy, S. Senthilarasu, A. Subbarayan, K. Natarajan, Solar Energy Mater. Solar Cells, 82, 187 (2004).
25. G. P. Daniel, V. B. Justinvictor, P. B. Nair, K. Joy, P. Koshy, P. V. Thomas, Physcia B, 405, 1782 (2010).
26. S. K. Nandi, S. Chakraborty, M. K. Bera, C. K. Maiti, Bull. Mater. Sci. 30, 247 (2007).
27. A. Sivasankar Reddy, G. Venkata Rao, S. Uthanna P. Sreedhara Reddy, Physica B, 370, 29 (2005).
28. J. W. Hoon, K. Y. Chan, J. Krishnasamy, T. Y. Tou D. Knipp, Appl. Surf. Sci., 257, 2515 (2011)]
29. C. F. Yu, C. W. sung, S. H. Chen, S. J. Sun, Appl. Surf. Sci., 256, 792 (2009).
30. R. Swanepoel, J. Phys. E: Sci. Instrum., 16, 1214 (1983).