Effect of substrate bias voltage on the physical properties of dc reactive magnetron sputtered NiO thin films

Materials Chemistry and Physics

Volumn 125, Issue 3, 2011, Pages 434-439

  Mallikarjuna Reddy, A ^a   Sivasankar Reddy, A ^b   Sreedhara Reddy, P ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b UNIVERSITY OF COIMBRA   (Portugal)

Author keywords

Electrical properties; Optical properties; Oxides; Sputtering

Indexed keywords

DC REACTIVE MAGNETRON SPUTTERING; DIRECT BAND GAP; ELECTRICAL PROPERTY; ELECTRICAL RESISTIVITY; GLASS SUBSTRATES; NIO FILMS; NIO THIN FILM; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL TRANSMITTANCE; PREFERENTIAL GROWTH; SEM; SUBSTRATE BIAS VOLTAGES;

BIAS VOLTAGE; ELECTRIC CONDUCTIVITY; HALL EFFECT; MAGNETIC FIELD EFFECTS; NICKEL OXIDE; OPTICAL PROPERTIES; OXIDE FILMS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

OPTICAL FILMS;

EID: 78650029368     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2010.10.035     Document Type: Article

References (27)

1. E. Fujji, A. Tomozawa, H. Torii, and R. Takayama Jpn. J. Appl. Phys. 35 1996 L328
2. M. Kitao, K. Izawa, K. Urabe, T. Komatsu, S. Kuwano, and S. Yamada Jpn. J. Appl. Phys. 33 1994 6656
3. H. Kumagai, M. Matsumoto, K. Toyoda, and M. Obara J. Mater. Sci. Lett. 15 1996 1081
4. H. Sato, T. Minami, S. Takata, and T. Yamada Thin Solid Films 236 1993 27
5. W. Estrade, A.M. Andersson, and C.G. Granqvist J. Appl. Phys. 64 1988 3678
6. D.A. Wruck, A.M. Dixon, M. Rubin, and S.N. Bogy J. Vac. Sci. Technol., A 9 1991 2170
7. J. Scarminio, W. Estrade, A. Andersson, A. Gorenstein, and F. Decker J. Electrochem. Sci. 139 1992 1236
8. C.R. Otterman, A. Temmink, and K. Bange Thin Solid Films 193-194 1990 409
9. T. Seike, and J. Nagai Sol. Energy Mater. 22 1991 107
10. L. Wang, Z. Zhang, and Y. Cao J. Ceram. Soc. Jpn. 101 1993 227
11. S.A. Mahmoud, A.A. Akl, H. Kamal, and K. Abdel-Hady Physica B 311 2002 366
12. L.J. van der Pauw Philips Res. Rep. 13 1958 1
13. B. Stjerna, E. Olsson, and C.G. Granqvist J. Appl. Phys. 76 1994 3797
14. A. Sivasankar Reddy, S. Uthanna, and P. Sreedhara Reddy Appl. Surf. Sci. 253 2007 5287
15. M.C. Barnes, S. Kumar, L. Green, N.M. Hwang, and A.R. Gerson Surf. Coat. Technol. 190 2005 321
16. Ch. Sujatha, G. Mohan Rao, and S. Uthanna Mater. Sci. Eng., B 94 2002 106
17. M. Ohring The Material Science of Thin Solid Films 1992 Academic Press New York
18. W. Buckel J. Vac. Sci. Technol., A 6 1969 606
19. J.L. Yang, Y.S. Lai, and J.S. Chen Thin Solid Films 488 2005 242
20. V.I. Fistual, and V.M. Vainshtein Sov. Phys. Solid State 8 1967 2769
21. S. Nandy, U.N. Maiti, C.K. Ghosh, and K.K. Chattopadhyay J. Phys.: Condens. Matter 21 2009 115804
22. H. Kamal, E.K. Elmaghraby, S.A. Ali, and A. Hady J. Cryst. Growth 262 2004 424
23. A. Hakim, J. Hossain, and K.A. Khan Renew. Energy 34 2009 2625
24. B. Subramanian, M.M. Ibrahim, V. Senthilkumar, K.R. Murali, V.S. Vidhya, C.S. Raja, and M. Jayachandran Physica B 403 2008 4104
25. R.K. Waits J. Vac. Sci. Technol. 15 1978 179
26. H.L. Chen, and Y.S. Yang Thin Solid Films 516 2008 5590
27. P. Mohan Babu, G. Venkata Rao, P. Sreedhara Reddy, and S. Uthanna J. Mater. Sci. Mater. Electron. 15 2004 389