Effect of the substrate surface topology and temperature on the structural properties of ZnO layers obtained by plasma enhanced chemical vapour deposition

Journal of Physics: Conference Series

Volumn 223, Issue 1, 2010, Pages

  Kitova, S ^a   Danev, G ^a  

^a CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DIAMOND FILMS; EDUCATION; GRAPHITE; ORGANOMETALLICS; OXIDANTS; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; STRUCTURAL PROPERTIES; SUBSTRATES; TOPOLOGY; VAPOR DEPOSITION; ZINC OXIDE; ZINC SULFIDE;

ACETYLACETONATES; C-AXIS DIRECTION; CRYSTAL QUALITIES; DEPOSITION PROCESS; HEXAGONAL WURTZITE STRUCTURE; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION; SUBSTRATE SURFACE; SUBSTRATE TEMPERATURE;

SILICON WAFERS;

EID: 77954725201     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/223/1/012022     Document Type: Conference Paper

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