Microstructure and optical properties of polycrystalline ZnO films sputtered under different oxygen flow rates

Journal of Alloys and Compounds

Volumn 488, Issue 1, 2009, Pages 232-237

  Wang, X C ^a   Chen, X M ^a   Yang, B H ^a  

^a TIANJIN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Crystal structure and symmetry; Optical properties; Semiconductors; Thin films

Indexed keywords

ANTI-SITE DEFECT; AVERAGE SURFACE ROUGHNESS; CONDUCTION BAND EDGE; CRYSTAL STRUCTURE AND SYMMETRY; CRYSTALLINITIES; OXYGEN FLOW RATES; PHOTOLUMINESCENCE PEAK; POLYCRYSTALLINE ZNO; RF-MAGNETRON SPUTTERING; SEMICONDUCTORS; VIBRATION BANDS; ZNO;

CRYSTAL SYMMETRY; ELECTRON MOBILITY; FLOW RATE; GRAIN GROWTH; HETEROJUNCTIONS; MAGNETRON SPUTTERING; METALLIC FILMS; OXYGEN; OXYGEN VACANCIES; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR GROWTH; SURFACE ROUGHNESS; THIN FILMS; ZINC; ZINC OXIDE;

OPTICAL PROPERTIES;

EID: 70449532198     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.08.089     Document Type: Article

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