Characterization of molybdenum oxide films prepared by bias magnetron sputtering

Journal of Optoelectronics and Advanced Materials

Volumn 11, Issue 3, 2009, Pages 320-325

  Nirupama, V ^a   Chandrasekhar, M ^a   Radhika, P ^b   Sreedhar, B ^b   Uthanna, S ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b INDIAN INSTITUTE OF CHEMICAL TECHNOLOGY   (India)

Author keywords

Electrical and optical properties; Magnetron sputtering; Molybdenum oxide films; Structure

Indexed keywords

BIAS VOLTAGE; CRYSTALLINITY; ELECTRIC CONDUCTIVITY; ENERGY GAP; MAGNETRON SPUTTERING; MOLYBDENUM METALLOGRAPHY; MOLYBDENUM OXIDE; OPTICAL BAND GAPS; OPTICAL FILMS; REFRACTIVE INDEX; STRUCTURE (COMPOSITION); SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DC MAGNETRON SPUTTERING; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL CONDUCTIVITY; HIGH ELECTRICAL CONDUCTIVITY; SUBSTRATE BIAS VOLTAGES; UNBIASED CONDITIONS; X-RAY DIFFRACTION STUDIES; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

OXIDE FILMS;

EID: 76049090472     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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