Radio frequency sputtered zinc oxide thin films with application to metal-semiconductor-metal photodetectors

Thin Solid Films

Volumn 515, Issue 18, 2007, Pages 7357-7363

  Li, Meiya ^a   Chokshi, Nehal ^b   DeLeon, Robert L ^b   Tompa, Gary ^b   Anderson, Wayne A ^a  

^a the State University of New York   (United States)

^b AMBP Tech Corporation   (United States)

Author keywords

Photodetectors; Sputtering; Zinc oxide

Indexed keywords

DARK CURRENTS; PHOTODETECTORS; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

POSTDEPOSITION ANNEALING; POSTDEPOSITION ANNEALING TREATMENT; RADIO FREQUENCY MAGNETRON SPUTTERING; ZNO METAL SEMICONDUCTOR METAL PHOTODETECTORS;

ZINC OXIDE;

EID: 34249112493     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.026     Document Type: Article

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