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Physica B: Condensed Matter

Volumn 370, Issue 1-4, 2005, Pages 29-34

Influence of substrate bias voltage on the properties of magnetron sputtered Cu2O films

(4) Reddy, A Sivasankar a Venkata Rao, G a Uthanna, S a Sreedhara Reddy, P a

a SRI VENKATESWARA UNIVERSITY (India)

Author keywords

Bias voltage; Cuprous oxide; Magnetron sputtering; Thin films

Indexed keywords

CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; DEPOSITION; ELECTRIC POTENTIAL; GLASS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; THIN FILMS;

BIAS VOLTAGE; CRYSTALLITES; CUPROUS OXIDE; GLASS SUBSTRATES;

COPPER OXIDES;

EID: 28244476415 PISSN: 09214526 EISSN: None Source Type: Journal
DOI: 10.1016/j.physb.2005.08.041 Document Type: Article

Times cited : (22)

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