The mechanism of low temperature deposition of crystalline anatase by reactive DC magnetron sputtering

Surface and Coatings Technology

Volumn 190, Issue 2-3, 2005, Pages 321-330

  Barnes, Mark C ^a   Kumar, Sunil ^a   Green, Len ^a   Hwang, Nong Moon ^b   Gerson, Andrea R ^a  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

^b Seoul National University   (South Korea)

Author keywords

Clusters; Nanostructures; Sputtering; Titanium oxide

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL REACTORS; CRYSTALLINE MATERIALS; FILM GROWTH; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; TITANIUM DIOXIDE;

CLUSTER SIZE; CRYSTALLINE ANATASE; LOW TEMPERATURE DEPOSITION; THEORY OF CHARGED CLUSTERS (TCC);

DEPOSITION;

NANOSTRUCTURE;

EID: 10144226436     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.003     Document Type: Article

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