The influence of substrate temperature on ZnO thin films prepared by PLD technique

Journal of Crystal Growth

Volumn 307, Issue 2, 2007, Pages 278-282

  Zhao, Yan ^a   Jiang, Yijian ^a   Fang, Yan ^b  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b CAPITAL NORMAL UNIVERSITY   (China)

Author keywords

A1. Crystal quality; A1. Photoluminescence; A1. Raman spectroscopy; A1. X ray diffraction; A3. Pulsed laser deposition; B2. Zinc oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; PHOTOLUMINESCENCE; PULSED LASER DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CRYSTAL QUALITY; OPTIMUM TEMPERATURE; SUBSTRATE TEMPERATURE; UV EMISSION PEAKS;

ZINC OXIDE;

EID: 34548409163     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.07.025     Document Type: Article

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