Gadolinium -niobates and -tantalates: Amorphous high-k materials by aqueous CSD

Journal of the Electrochemical Society

Volumn 159, Issue 6, 2012, Pages

  Dewulf, D ^a,b   Hardy, A ^a,b   Van Elshocht, S ^b   De Dobbelaere, C ^a   Wang, W C ^c   Badylevich, M ^c   Afanasev, V V ^c   De Gendt, S ^b,c   Van Bael, M K ^a,b  

^a HASSELT UNIVERSITY   (Belgium)

^b IMEC   (Belgium)

^c UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; CAPACITANCE VOLTAGE; CURRENT VOLTAGE; HIGH-K MATERIALS; K-VALUES; NIOBATES; ULTRA-THIN OXIDE FILMS; XRD;

AMORPHOUS FILMS; AMORPHOUS MATERIALS; NIOBIUM OXIDE;

GADOLINIUM;

EID: 84861360017     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.072206jes     Document Type: Article

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