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Chemical Vapor Deposition

Volumn 18, Issue 1-3, 2012, Pages 10-16

Gas-pulsed cvd for film growth in the Cu-Ni-N system

(3) Lindahl, Erik a Ottosson, Mikael a Carlsson, Jan Otto a

a UPPSALA UNIVERSITY (Sweden)

Author keywords

Cu Ni N system; Cu 3 xNi x+yN; Gas pulsed CVD; Metastable nitrides

Indexed keywords

BINARY COMPOUNDS; CU(HFAC)2; CU-NI-N SYSTEM; CVD PROCESS; GAS PULSE; METAL COMPOSITION; METAL CONTENT; MULTICOMPONENTS; PRECURSOR MIXTURE;

AMMONIA; ELECTRIC PROPERTIES; FILM GROWTH; MICROELECTRONICS; MONOLAYERS; NANOCOMPOSITE FILMS; NITRIDES; SEPARATION; SOLID SOLUTIONS;

GASES;

EID: 84859082266 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.201106919 Document Type: Article

Times cited : (7)

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