Highly conformal Cu thin-film growth by low-temperature pulsed MOCVD

Electrochemical and Solid-State Letters

Volumn 6, Issue 8, 2003, Pages

  Kim, Kwansoo ^a   Yong, Kijung ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; ELECTROMIGRATION; LOW TEMPERATURE EFFECTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DETECTION LIMITS;

FILM GROWTH;

EID: 0042768073     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1587071     Document Type: Article

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