The effect of hydrogen on Cu3N thin films deposited by radio frequency magnetron sputtering

Journal of Applied Physics

Volumn 100, Issue 10, 2006, Pages

  Wang, J ^a   Chen, J T ^a   Miao, B B ^a   Zhang, F ^a   Yan, P X ^a,b  

^a LANZHOU UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPOUNDS; CRYSTALLIZATION; DEPOSITION; ELECTRIC CONDUCTIVITY; ENERGY GAP; HYDROGEN; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY; X RAY DIFFRACTION;

HYDROGEN ENGENDERED; OPTICAL ENERGY GAP; VACUUM CHAMBER;

THIN FILMS;

EID: 33845200353     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2388123     Document Type: Article

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