Preparation of a new tetragonal copper oxynitride phase by reactive magnetron sputtering

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 282-284

  Von Richthofen, A ^a   Domnick, R ^a   Cremer, R ^a   Neuschutz D ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Copper oxynitride; Coppernitride; Copperoxide; Cu O N; MSIP

Indexed keywords

COPPER COMPOUNDS; CRYSTAL STRUCTURE; FILM GROWTH; HIGH ENERGY ELECTRON DIFFRACTION; MAGNETRON SPUTTERING; PLASMAS; SPUTTER DEPOSITION; SURFACE STRUCTURE; TEXTURES; X RAY DIFFRACTION ANALYSIS;

COPPER OXYNITRIDE; MAGNETRON SPUTTERING ION PLATING; REACTIVE MAGNETRON SPUTTERING;

MULTILAYERS;

EID: 0032049891     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00538-5     Document Type: Article

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