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Volumn 8, Issue 8-9, 1999, Pages 1715-1719

Cu3N films prepared by the low-pressure r.f. supersonic plasma jet reactor: Structure and optical properties

Author keywords

Copper nitride; Optical properties; Plasma chemical deposition; Structure

Indexed keywords

ELASTIC MODULI; ENERGY GAP; FILM GROWTH; FILM PREPARATION; MICROHARDNESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA JETS; STOICHIOMETRY; STRUCTURE (COMPOSITION); SURFACE TREATMENT; THIN FILMS;

EID: 0032594137     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(99)00063-1     Document Type: Article
Times cited : (40)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.